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Article
Al1-x ScxN Thin Film Structures for Pyroelectric Sensing Applications
AlN thin film structures have many useful and practical piezoelectric and pyroelectric properties. The potential enhancement of the AlN piezo- and pyroelectric constants allows it to compete with more commonly...
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Article
Deep Traps in AlGaN/GaN Heterostructure Field-Effect Transistors Studied by Current-Mode Deep-Level Transient Spectroscopy: Influence of Device Location
Across-wafer variation of deep traps in AlGaN/GaN heterostructure field- effect transistors (HFETs) has been studied using current-mode deep-level transient spectroscopy (I-DLTS). It is found that applying a b...
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Article
Traps in 4H-SiC Field-Effect Transistors Characterized by Capacitance- and Current-Mode Deep-Level Transient Spectroscopy
Traps in SiC long-gate metal–semiconductor field-effect transistors (FATFETs) at different wafer positions have been characterized by deep-level transient spectroscopy (DLTS) based on capacitance (C-DLTS) or c...
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Article
Comparison of Epitaxial Graphene on Si-face and C-face 6H-SiC
We present atomic force microscopy (AFM), Hall-effect measurement, and Raman spectroscopy results from graphene films on 6H-SiC (0001) and (000-1) faces (Si-face and C-face, respectively) produced by radiative...
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Article
Vapor-phase Growth of High-quality ZnO Micro- and Nano-structures
Micro- and nano-structures of ZnO have been grown on substrates from flowing carrier gases in a tube furnace. We have investigated how variations in the carrier gas composition, gas flow rate and the position ...
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Article
Effects of Electron Irradiation on Deep Centers in High-Purity Semi-Insulating 6H-SiC
Many point-defect–related centers have been investigated in electron-irradiated 6H-SiC by deep-level transient spectroscopy (DLTS). Most of them are believed to be related to vacancies. Our DLTS studies on dee...
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Article
Changes in Electrical Characteristics of ZnO Thin Films Due to Environmental Factors
The impact of light and controlled gas ambient on the electrical characteristics of ZnO:P grown by pulsed laser deposition (PLD) is investigated with temperature-dependent Hall-effect and photo-Hall-effect usi...
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Article
Thermally stimulated current spectroscopy of high-purity semi-insulating 4H-SiC substrates
High-purity semi-insulating (HPSI) 4H-SiC has been widely used as a substrate material for AlGaN/GaN high electron-mobility transistors because of its fairly good lattice match with GaN and its high thermal co...
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Article
Electrical and Magnetic Characteristics of MBEGrown GaMnN
We present magnetometry and charge transport data for a GaMnN film with approximately 7% (atomic) Mn grown by molecular beam epitaxy. Measurements of magnetization vs. applied magnetic field show hysteresis co...
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Article
Electrical and Optical Properties of n-type and p-type ZnO
In recent years, ZnO has been proposed for new electronic and optoelectronic devices, such as transparent transistors and UV light-emitting diodes (LEDs). The LED application will require both n-type and p-typ...
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Article
Remote Plasma Enhanced-Metal Organic Chemical Vapor Deposition of Zirconium Oxide/Silicon Oxide Alloy, (ZrO2)1−(SiO2)1−x (x:≤0.5), Thin Films for Advanced High-K Gate Dielectrics
A remote plasma enhanced-metal organic chemical vapor deposition (RPE-MOCVD) process was developed for the preparation of non-crystalline (ZrO2)x-(SiO2)1−x (x ≤ 0.5) alloys, targeting the compound composition ZrS...
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Article
High-k Dielectrics and Dual Metal Gates: Integration Issues for New CMOS Materials
Several metal and conducting metal nitride candidates were investigated for alternative gate electrode applications in future complimentary metal-oxide-semiconductor (CMOS) devices. High frequency capacitance-...
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Article
How do Impurities Affect the Growth of μc-Si:H?
Ultra clean plasma CVD process opens the doorway to clarify the role of impurities in the growth process of μc-Si:H. A reduction of impurity levels during the growth extends the temperature range for crystalli...
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Article
Chemical Stability of Advanced Metal Gate and Ultra-thin Gate Dielectric Interface During Rapid Thermal Annealing
The chemical stability of the compound metals TiNx and WNx on SiO2 and SiO2/Si3N4 (ON) dielectric stacks is studied by on-line Auger electron spectroscopy (AES) following sequential rapid thermal annealing treatm...
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Article
Investigation of the Growth and Chemical Stability of Composite Metal Gates on Ultra-thin Gate Dielectrics
The growth of reactively sputtered TiNx and WNx compound metal films on ultra-thin, remote plasma enhanced chemical vapor deposited SiO2 and SiO2/Si3N4 (ON) stack dielectrics is investigated from initial interfac...
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Article
Nucleation of p-Type Microcrystalline Silicon on Amorphous Silicon for n-i-p Solar Cells Using B(CH3)3 And BF3 Dopant Source Gases
Real time spectroscopic ellipsometry (RTSE) has been applied to identify optimal conditions for the nucleation and growth of 120 Å microcrystalline silicon (μc-Si:H) p-layers by rf plasma-enhanced chemical vap...
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Article
α -RuCl3: A New Host for Polymer Intercalation. Lamellar Polymer/α -RuCI3 Nanocomposites.
α -RuCl3 was identified as a new host for polymer intercalation using different intercalative methods. It is found that Li0.2RuCl3 exfoliates in water into single [RuCl3]x− layers which can be used to encapsulate...
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Article
Photoinduced Reversible Conductivity and Photoconductivity Changes in Transparent Amorphous and Micro-Crystalline In2O3-x FILMS
The dark conductivity σ of poorly conducting In2O3-x films can be enhanced by orders of magnitude by blue or UV light exposure at any temperature between 4.2K and 300K. The resulting high σ state of amorphous fil...
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Article
Reversible Changes in the Electronic and Optical Properties of Micro-Crystalline In2O3-x: A Comparison with Amorphous In2O3-x
The electrical conductance and optical absorption coefficient of microcrystalline indium oxide (c–In2O3–x) can be changed reversibly by several orders of magnitude by photoreduction and reoxidation. Photoreductio...
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Article
The Role of oxygen diffusion in photoinduced changes of the electronic and optical properties in amorphous indium oxide
A stable increase by as much as 108 in the conductivity of amorphous indium oxide to σ≥ 103Ω-1 cm−1 can be achieved by ultraviolet photoreduction. This treatment also increases the absorption coefficient, α(hυ), ...