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    Fabrication and characterization of Al nanomechanical resonators for coupling to nanoelectronic devices

    We report on a suspension technique for Al doubly clamped beams. The technique is based on two consecutive reactive ion etching processes in CF4 plasma, anisotropic and isotropic, of SiO x ...

    K. Harrabi, Y. A. Pashkin, O. V. Astafiev, S. Kafanov, T. F. Li… in Applied Physics A (2012)