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High Quality Non-Alloyed Pt Ohmic Contacts to p-Type GaN Using Two-Step Surface Treatment

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  1. Article

    High Quality Non-Alloyed Pt Ohmic Contacts to P-Type GaN Using Two-Step Surface Treatment

    Two-step surface-treatment is introduced to obtain low resistance Pt contacts to p-type GaN. The first step is performed after the mesa etching process using buffered oxide etch (BOE) and ammonium sulfide [(NH4)2

    Ja-Soon Jang, Seong-Ju Park, Tae-Yeon Seong in MRS Internet Journal of Nitride Semiconduc… (2000)

  2. Article

    Improved Low Resistance Contacts of Ni/Au and Pd/Au to p-Type GaN Using a Cryogenic Treatment

    A low resistance Ohmic contact to p-type GaN is essential for reliable operation of electronic and optoelectronic devices. Such contacts have been made using Ni/Au and Pd / Au contacts to p-type Mg-doped GaN (...

    Mi-Ran Park, Wayne A. Anderson in MRS Internet Journal of Nitride Semiconduc… (2000)