5 Result(s)
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Chapter and Conference Paper
Electron Beam Nanolithography
Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is imp...
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Chapter and Conference Paper
Electron Beam Lithography and Dry Etching Techniques for the Fabrication of Quantum Wires in GaAs and AlGaAs Epilayer Systems
Research on transport in low dimensional semiconductor systems has recently progressed from simple layered structures to patterned devices of much greater complexity. The development of fabrication techniques ...
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Chapter
Quantum Wires and Dots: The Challenge to Fabrication Technology
In these lectures I will argue that the fabrication of quantum dots and wires for optical applications presents the severest challenge to semiconductor nanotechnology. The dimensional requirements of these str...
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Chapter
Fabrication and Simulation of 0.1 μm Pseudomorphic HEMTs
When the gate length of the pseudomorphic HEMTs (PsHEMTs) approaches 0.1 μm, short channel effects become limiting factor for the device performance, leading to a large negative threshold voltage shift, increa...
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Chapter
Basic of Pseudomorphic Hemts Technology and Numerical Simulation
This chapter consist of two parts. In the first part we describe the technology used in the Nanoelectronics Research Centre of Glasgow University for fabrication of high performance 200 - 100 nm gate length Ps...
