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Chapter and Conference Paper
Electron Beam Nanolithography
Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is imp...
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Chapter and Conference Paper
Electron Beam Lithography and Dry Etching Techniques for the Fabrication of Quantum Wires in GaAs and AlGaAs Epilayer Systems
Research on transport in low dimensional semiconductor systems has recently progressed from simple layered structures to patterned devices of much greater complexity. The development of fabrication techniques ...
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Chapter
Fabrication and Simulation of 0.1 μm Pseudomorphic HEMTs
When the gate length of the pseudomorphic HEMTs (PsHEMTs) approaches 0.1 μm, short channel effects become limiting factor for the device performance, leading to a large negative threshold voltage shift, increa...