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    Article

    Improved work function of preferentially oriented indium oxide films induced by the plasma exposure technique

    The preferentially oriented In2O3 thin films were prepared on glass substrates by conventional magnetron sputtering with Ar+ plasma exposure at room temperature. Based on the x-ray diffraction, x-ray photoelectro...

    Lei Yang, Shuai Guo, Qiuling Yang, Yuankun Zhu, Bing Dai… in Electronic Materials Letters (2015)