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  1. No Access

    Article

    Hydroxyapatite Coating on Thermal Titanium Substrate in Aqueous Solution

    A hydroxyapatite, HAP, film was deposited on a titanium substrate in an aqueous solution, at an ambient temperature and ambient pressure. The solution included 3 mmoldm-3 Ca(H2PO4)2 and 7 mmol dm-3 CaCl2 at pH 5....

    M. Okido, R. Ichino, K. Kuroda, R. Ohsawa, O. Takai in MRS Online Proceedings Library (1999)

  2. No Access

    Article

    Photo and Scanning Probe Lithography Using Alkylsilane Self-Assembled Monolayers

    An organic film of a few nm in thickness was applied as a resist for photolithography and scanning probe lithography. This resist film was prepared on an oxide-covered Si substrate through chemisorption and sp...

    H. Sugimura, T. Hanji, O. Takai, K. Fukuda, H. Misawa in MRS Online Proceedings Library (1999)

  3. No Access

    Article

    Nanomechanical Properties of Amorphous Carbon and Carbon Nitride Thin Films Prepared by Shielded Arc Ion Plating

    Hydrogen free amorphous carbon (a-C) and carbon nitride (a-C:N) were synthesized by means of shielded arc ion plating in which a shielding plate was inserted between a target and a substrate in order to reduce...

    N. Tajima, H. Saze, H. Sugimura, O. Takai in MRS Online Proceedings Library (1999)

  4. No Access

    Article

    Nanomechanical Properties of Amorphous Carbon and Carbon Nitride Thin Films Prepared by Shielded Arc Ion Plating

    Hydrogen free amorphous carbon (a-C) and carbon nitride (a-C:N) were synthesized by means of shielded arc ion plating in which a shielding plate was inserted between a target and a substrate in order to reduce...

    N. Tajima, H. Saze, H. Sugimura, O. Takai in MRS Online Proceedings Library (1999)

  5. No Access

    Article

    Synthesis and properties of CeN thin films deposited by arc ion plating

    Cerium nitride films were deposited by ion plating in an electron-beam sustained Ce arc discharge in a nitrogen atmosphere. The crystal structure was strongly affected by the arc discharge current and the subs...

    S. Q. **ao, K. Tsuzuki, H. Sugimura, O. Takai in Journal of Materials Science (1998)

  6. No Access

    Article

    Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition

    Preparation of transparent water-repellent films was carried out using three kinds of fluoroalkyl silanes (FASs) by radio-frequency plasma-enhanced chemical vapour deposition. The effects of the reaction condi...

    A HOZUMI, H SEKOGUCHI, N KAKINOKI, O TAKAI in Journal of Materials Science (1997)