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Article
Changes in Preferred Orientation of Pt Thin Films Deposited by dc Magnetron Sputtering Using Ar/O2 Gas Mixtures
(200)-oriented Pt thin films were deposited on SiO2/Si substrates by dc magnetron sputtering using Ar/O2 gas mixtures. Oxygen incorporation into Pt films changed deposition rate, resistivity, stress, and preferre...
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Article
Highly (200)-oriented Pt films on SiO2/Si substrates by seed selection through amorphization and controlled grain growth
Highly (200)-oriented Pt films on SiO2/Si substrates were successfully prepared by a combination of a dc magnetron sputtering using Ar/O2 gas mixtures and subsequent controlled annealing. The intensity ratio of (...
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Article
Low-Temperature Metalorganic Chemical Vapor Deposition of Gallium Nitride on (0001) Sapphire Substrates Using a Remote RF Nitrogen Plasma
We report the low-temperature growth of GaN layers on (0001) sapphire substrates by a remote plasma enhanced metal-organic chemical vapor deposition in the temperature range of 500–800 °C. Effects of process p...
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Article
Stress of Platinum Thin Films Deposited by Dc Magnetron Sputtering Using Argon/Oxygen Gas Mixture
Pt thin films were deposited by a DC magnetron sputtering with Ar/O2 gas mixtures. Due to the oxygen incorporation into the Pt films, deposition rate and resistivity of as-deposited Pt thin films increased with o...
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Article
Nitrogen Plasma Pretreatment of Sapphire Substrates for the GaN Buffer Growth by Remote Plasma Enhanced MOCVD
Low-temperature GaN buffer layers with smooth surfaces and high crystallinity could be prepared by a remote plasma enhanced metalorganic vapor deposition after the pretreatment of substrates with rf nitrogen p...
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Article
(100) Oriented Platinum thin Films Deposited by Dc Magnetron Sputtering On SiO2/Si Substrates
Platinum(Pt) films were sputter-deposited on Si02/Si substrates under the mixed gas atmosphere of Ar and O2. Under certain deposition conditions, the films were oriented such that the (100) direction is normal to...
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Article
Characterization of Platinum films Deposited by a Two-Step Magnetron Sputtering on SiO2/Si Substrates
In this study, defect-free Pt films with good adhesion were deposited on SiO2/Si substrates by a two-step magnetron sputtering. This method consists of the first sputtering step using Ar/O2 gas mixture and the se...
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Article
(Mn,Zn,Fe)1−xO thin films showing ferrimagnetic property deposited by ion beam sputtering
We deposited (Mn,Zn,Fe)1−xO thin films of a wüstite structure on SiO2/Si(100) by ion beam sputtering using a single-crystal Mn-Zn ferrite target. The wüstite structure of the as-deposited film, confirmed by XRD, ...
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Article
Preferred orientation and microstructure of Ni-Zn-Cu ferrite thin films deposited by rf magnetron sputtering
We have investigated the effects of process parameters such as rf power, substrate, and gas pressure PAr on preferred orientation, microstructure, and magnetic properties of Ni-Zn-Cu ferrite thin films deposited ...
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Article
Effects of the Substrate Temperature on the Crystallization and Development of Texture of Mn-Zn Ferrite thin Films Deposited by Ion Beam Sputtering
We investigated the effects of the substrate temperature(Ts) on the crystallization and the development of texture of Mn-Zn ferrite thin films on SiO2/Si(100) under ion bombardment during ion beam sputtering. As-...