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    Chapter and Conference Paper

    Reduction of Bubble-Induced Defect in Semiconductor Lithography Process

    In this study, methods for suppressing the occurrence of air bubbles in the photoresist (PR) dispensing apparatus of photo lithography system in semiconductor manufacturing process were analyzed. The proposed ...

    Kyoung-Whan Oh, Takashi Sasa, Seok Heo… in Towards AI-Aided Invention and Innovation (2023)