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  1. No Access

    Article

    Deposition of copper oxide by reactive magnetron sputtering

    Copper oxide films were deposited on silicon substrates by direct current magnetron sputtering of Cu in a mixture of O2 and Ar gases. Oxidation of the target as a result of adsorption or ion-plating of the reacti...

    J. H. Lee, K. H. Jeong, W. H. Cho, W. J. Ho… in Metals and Materials International (2011)

  2. No Access

    Article

    Effects of substrate bias power on the surface of ITO electrodes during O2/CF4 plasma treatment and the resulting performance of organic light-emitting diodes

    During surface treatment using O2/CF4 plasma chemistry, the bias power applied to the indium-tin-oxide(ITO) substrate significantly degrades the electrical and optical performance of the organic light emitting di...

    D. M. Han, J. H. Lee, K. H. Jeong, J. G. Lee in Metals and Materials International (2010)