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Article
Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process
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Article
Formation of nanorod-like structures through the thermal annealing of Cr films
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Article
Time evolution of In2O3 rod-like structures in metalorganic chemical vapor deposition process
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Article
Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas
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Article
MOCVD route to In2O3 thin films on SiO2 substrates
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Article
Application of N2/Ar inductively coupled plasma → the photoresist ashing for low-k dielectrics