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    Chapter

    Study on the Properties and Damage Analysis on the Lining Used in Cooling Section of Coke Dry Quench Furnaces

    In order to increase the service life of large scale coke dry quenching furnaces, the damage mechanism of lining was investigated, and the structure and properties of lining refractories used in cooling sectio...

    G. Xu, Y. Wang, Y. Lv, J. Sheng, H. Zhang in 7th International Symposium on High-Temper… (2016)

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    Article

    Enthalpies of formation of liquid dysprosium-bismuth alloys

    J. Sheng, H. Yamana, H. Moriyama in Journal of Materials Science Letters (2001)

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    Article

    Application of a linear free energy relationship to lanthanide-zinc alloys

    J. Sheng, H. Yamana, H. Moriyama in Journal of Materials Science Letters (2001)

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    Article

    Low-temperature formation of photocatalytic Pt-anatase film by magnetron sputtering

    Films of TiO2 dispersed or coated with platinum were deposited on glass and Pt-buffered polyamide substrates respectively by magnetron sputtering. The photocatalytic activity of the films was evaluated through th...

    J. Sheng, L. Shivalingappa, J. Karasawa, T. Fukami in Journal of Materials Science (1999)

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    Article

    Oxygen dependence of Schottky barriers on niobium-doped strontium titanate single crystal

    J. SHENG, K. MASUDA, T. FUKAMI in Journal of Materials Science Letters (1997)

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    Article

    Thickness dependence of photocatalytic activity of anatase film by magnetron sputtering

    J. SHENG, J. KARASAWA, T. FUKAMI in Journal of Materials Science Letters (1997)

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    Article

    Characterization of CdTe for HgCdTe surface passivation

    The objectives of this work are to study the physical and chemical structure of CdTe films using secondary ion mass spectrometry (SIMS) and atomic force miroscopy (AFM) and to demonstrate the usefulness of the...

    L. O. Bubulac, W. E. Tennant, J. Bajaj, J. Sheng in Journal of Electronic Materials (1995)

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    Article

    The Detailed Dependence of Implanted Phosphorus Profiles in (100) Single-Crystal Si on Key Implant Parameters

    The continued decrease in semiconductor device feature size has required much smaller thermal processing budgets in order to achieve the required compact do** profiles. As a result, the impurity profiles hav...

    V. Ghante, L. M. Lam, S. Morris, S.-H. Yang, A. F. Tasch in MRS Online Proceedings Library (1995)