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    Evaluation of citric acid added cleaning solution for removal of metallic contaminants on Si wafer surface

    We have investigated cleaning solutions based on citric acid (CA) to remove metallic contaminants from the silicon wafer surface. Silicon wafers were intentionally contaminated with Fe, Ca, Zn, Na, Al and Cu s...

    Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho… in Korean Journal of Chemical Engineering (2001)