15 Result(s)
within
G. E. Remnev
Materials Science
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Article
Optical Properties of Al–Si–N Coatings Deposited by Reactive Magnetron Sputtering on Steel 12H18N10T and Zirconium Alloy E110
The optical properties of Al–Si–N nanocomposite coatings deposited by reactive magnetron sputtering on substrates of stainless steel 12H18N10T and zirconium alloy E110 are studied. The absorption and luminesce...
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Article
Effect of the Content of Silicon on the Optical Properties of Al–Si–N Coatings Irradiated with Carbon Ions in the Short-Pulse Implantation Mode
The effect of short-pulse irradiation with 200-keV carbon ions on the optical and electrical properties of aluminum-nitride films and Al–Si–N coatings with variable atomic composition deposited by reactive mag...
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Article
Effect of High-Power Ion Beams on the Surface Topography and Structure of the Subsurface Layer of Submicrocrystalline Titanium Alloys
The influence of high-power beams of carbon ions (the ion energy is 250 keV; the pulse duration is ~100 ns; the current density in the pulse is 150–200 A/cm2; the surface energy density of a single pulse is j ~ 3...
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Article
Titanium Alloy Surface Complex Modification
Results are provided for a study of the effect of mechanical and ion-beam treatment on titanium alloys surface relief parameters. The possibility is demonstrated of changing component surface roughness over a ...
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Article
Structure and Phase Composition of Multilayer AlN/SiN Films Irradiated with Helium Ions
The results of investigating the microstructure and phase composition of AlN/SiNx multilayer films with alternating nanocrystalline aluminum nitride (nc-AlN) and amorphous silicon nitride (a-SiNx) phases, which w...
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Article
Radiation Stability of Metal Fe0.56Ni0.44 Nanowires Exposed to Powerful Pulsed Ion Beams
The resistance of Fe0.56Ni0.44 alloy nanowires (fabricated by template synthesis using polymer track membranes) 60 and 100 nm in diameter to radiation with powerful pulsed 85% C+ + 15% H+ ions (E = 20 keV, j = 10...
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Article
On the physical nature of the threshold displacement energy in radiation physics
A formula for numerical estimation of the threshold energy E d of atomic displacement from lattice sites upon the irradiation of solids is proposed for the first time. The E ...
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Article
Influence of the high-intensity short-pulse implantation of ions on the properties of polycrystalline silicon
The electrical and photoelectric properties of polycrystalline Si are studied after the high-intensity short-pulse implantation of C ions. It is established that annealing in vacuum (10–2 Pa, 300–1200 K) affects ...
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Article
Dynamic processes in metal nanoparticles under irradiation
Dynamic processes occurring in a nanoscale metal object during the implantation of high-energy ions are studied in detail. It is shown that the elastic and thermoelastic lattice responses to irradiation form f...
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Article
Thermal and chemical passivation of gallium-arsenide films deposited from ablation plasma
The electric and photoelectric properties of gallium-arsenide films deposited on a polycrystalline corundum substrate from the ablation plasma formed by a high-power ion beam are investigated. It is ascertaine...
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Article
Modification of the T15K6 hard alloy with high-power pulsed ion beams and compression plasma fluxes
The change in the morphology, phase composition, hardness of surface layers, microstructure, and elemental composition of the inner layers of an alloy under the effect of high-power pulsed ion beams (HIBs) and...
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Article
Changes in microstructure of cold-worked aluminum-lithium alloy 1441 initiated by powerful pulsed ion beams
The results of an electron microscopy study of alloy 1441 of the Al-Cu-Mg-Li-Zr-Mn system after cold rolling (ɛ = 72%) and subsequent irradiation with a powerful pulsed ion beam (70%C+ + 30%H+) in the pulsed-peri...
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Article
Optical properties of GaAs films deposited via pulsed ion ablation
Optical reflectance and absorbance of gallium arsenide films formed on polycrystalline corundum, quartz glass, and copper foil are investigated in the energy interval of 1.1–6.2 eV. The films have been deposit...
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Article
High-Rate Deposition of Thin Films by High-Intensity Pulsed Ion Beam Evaporation
We demonstrate a novel technique for in situ observation of the chemical vapor deposition of high purity gold using ethyl(trimethylphosphine)gold(I). an environmental transmission electron microscope with 3.8 ...
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Article
Growth and Structure of Thin Films by High-Intensity Pulsed Ion-Beam Deposition
The high-intensity pulsed ion-beam (HIPIB)/solid interaction results in the generation of an ablated plasma ( ∼1020 cm-3; ∼1 eV) which can be used to advantage for the deposition of thin films. Presented are the ...
