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    Nucleation of Metal Clusters on Carbon Nanotubes

    Electromigration in metal interconnects limits the number of devices in a single microprocessor. This limitation has already led to the replacement of Al as interconnect material by Cu, which has a higher curr...

    X. Ke, A. Felten, D. Liang, S. Bals… in EMC 2008 14th European Microscopy Congress… (2008)