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    Depth profiling of semiconductor structures by X-ray microanalysis using the electron probe energy variation technique

    Depth profiling of semiconductor structures by X-ray microanalysis using the electron probe variation technique followed by mathematical processing of the measurement results is described. Experimental depende...

    L. A. Bakaleinikov, Ya. V. Domrachova, E. V. Kolesnikova… in Semiconductors (2009)