Skip to main content

and
  1. No Access

    Article

    Evaluation of citric acid added cleaning solution for removal of metallic contaminants on Si wafer surface

    We have investigated cleaning solutions based on citric acid (CA) to remove metallic contaminants from the silicon wafer surface. Silicon wafers were intentionally contaminated with Fe, Ca, Zn, Na, Al and Cu s...

    Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho in Korean Journal of Chemical Engineering (2001)

  2. No Access

    Article

    Collection Efficiency of Metallic Contaminants on Si Wafer by Vapor-Phase Decomposition-Droplet Collection

    The collection efficiency of metallic contaminants on four different types of silicon wafers was investigated. P, p+, n and n+-type polished silicon wafers were used for the substrate, and 14 metallic elements (N...

    Hye-Young Chung, Young-Hun Kim, Hyo-Yong Cho, Bo-Young Lee in Analytical Sciences (2001)