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Open AccessHighly conductive and flexible fiber for textile electronics obtained by extremely low-temperature atomic layer deposition of Pt
Thermal atomic layer deposition (ALD) of metal has generally been achieved at high temperatures of around 300 °C or at relatively low temperatures with highly reactive counter reactants, including plasma radic...
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Open AccessA facile method for the selective decoration of graphene defects based on a galvanic displacement reaction
Inherent defects, such as grain boundaries (GBs), wrinkles and structural cracks, present on chemical vapor deposition (CVD)-grown graphene are inevitable because of the mechanism used for its synthesis. Becau...