Slip, Crystal Orientation, and Damage Evolution During Thermal Cycling in High-Strain Wafer-Level Chip-Scale Packages

Abstract

Wafer-level chip-scale package samples with pre-cross-sectioned edge rows were thermally cycled to study microstructure evolution and damage development. Electron backscattered diffraction (EBSD) and high-energy x-ray diffraction were used to obtain Sn grain orientations and the average coefficient of thermal expansion normal to the board in every joint of the package for samples in the as-fabricated and thermally cycled conditions. The results indicated a near-random distribution of joint orientation. Optical, scanning electron microscopy, and EBSD methods were used to characterize microstructure changes in pre-cross-sectioned samples due to thermal cycling. Slip trace analysis and Orientation Imaging Microscopy™ (OIM) show that slip systems with high Schmid factors (estimated global shear stress based on the package neutral point) are responsible for the observed microstructure evolution during thermal cycling, which provides information about slip systems that are more easily activated. Two joints were analyzed in detail to evaluate slip activity at different stages of their thermal history. The first case showed that a solidification twin grain boundary misorientation deviated from the twin relationship due to slip activity during thermal cycling, which can influence damage development and the path of crack propagation. The second case showed a new grain orientation develo** due to gradual lattice rotation about the Sn [110] axis by a continuous recrystallization mechanism. This rotation was correlated with the operation of slip system $\{ 110 )\langle \left. {001} \right]$. Small tin whiskers emerged from the initially polished chip interface and grew with increasing thermal cycles until a crack developed in the solder that relieved the stress. As the local stresses are not known experimentally, this analysis provides observations that can be compared with a crystal plasticity model simulation.