Graphene-Based Interconnect for Semiconductor-Plausible Goal or Elusive Goal?

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Abstract

The continuous miniaturization and increasing complexity of semiconductor devices have necessitated the development of advanced interconnect technologies. Graphene, a two-dimensional (2D) material with exceptional electrical and mechanical properties, has emerged as a promising candidate for next-generation interconnects. This chapter explores the feasibility and challenges associated with implementing graphene-based interconnects in the semiconductor industry. By examining the current state of research, fabrication techniques, and potential applications, we aim to determine whether graphene-based interconnects are a plausible goal or remain an elusive goal.

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Acknowledgments

The authors of this chapter and the editors of this book consider plagiarism prevention to be important. Therefore, we conducted a similarity check with this chapter for preventing plagiarism. According to the Turnitin program, this chapter has a similarity score of 3%, with most of the similarities attributed to the authors’ affiliations and specialized terminology. We would like to express our sincere gratitude to the Turnitin program for enabling this plagiarism detection process.

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Correspondence to Young Suh Song .

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Song, Y.S. (2024). Graphene-Based Interconnect for Semiconductor-Plausible Goal or Elusive Goal?. In: Song, Y.S., Thoutam, L.R., Tayal, S., Rahi, S.B., Samuel, T.S.A. (eds) Handbook of Emerging Materials for Semiconductor Industry. Springer, Singapore. https://doi.org/10.1007/978-981-99-6649-3_61

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