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Surface Science and Semiconductor Processing

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Crucial Issues in Semiconductor Materials and Processing Technologies

Part of the book series: NATO ASI Series ((NSSE,volume 222))

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Abstract

After twenty years of surface science one may ask the question: what impact is there on semiconductor processing today? The answer is given by looking at developments in the equipment industry.

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References

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Author information

Authors and Affiliations

  1. FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ, Amsterdam, The Netherlands

    F. W. Saris

Authors
  1. F. W. Saris
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Editor information

Editors and Affiliations

  1. Physics Department, University of Catania, Catania, Italy

    S. Coffa , F. Priolo  & E. Rimini ,  & 

  2. AT&T Bell Laboratories, Murray Hill, New Jersey, USA

    J. M. Poate

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© 1992 Springer Science+Business Media Dordrecht

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Saris, F.W. (1992). Surface Science and Semiconductor Processing. In: Coffa, S., Priolo, F., Rimini, E., Poate, J.M. (eds) Crucial Issues in Semiconductor Materials and Processing Technologies. NATO ASI Series, vol 222. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-2714-1_15

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  • DOI: https://doi.org/10.1007/978-94-011-2714-1_15

  • Publisher Name: Springer, Dordrecht

  • Print ISBN: 978-94-010-5203-0

  • Online ISBN: 978-94-011-2714-1

  • eBook Packages: Springer Book Archive

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