Extension of Surface/Bulk Micromachining: One-Mask Fabrication Technology Enabling the Integration of 6-DoF Inertial Sensors on a Single Wafer

  • Conference paper
Transducers ’01 Eurosensors XV

Summary

In this paper, a new technology that enables the fabrication of single-crystal silicon microstructures capable of detecting the vertical motion without a bottom electrode is presented. The vertical-motion sensing is realized by fabricating a quasi-vertical comb electrode. The quasi-vertical comb electrode is fabricated by utilizing the RIE lag phenomenon. This vertical sensing scheme allows the integration of 6-DoF inertial sensors on a single wafer. The developed process for vertical electrodes is very simple and needs only one mask. Currently work is underway to test the performance of the fabricated inertial sensor.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Subscribe and save

Springer+ Basic
EUR 32.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or Ebook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Chapter
EUR 29.95
Price includes VAT (France)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
EUR 85.59
Price includes VAT (France)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
EUR 105.49
Price includes VAT (France)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free ship** worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

Similar content being viewed by others

References

  1. K. A. Shaw, Z. L. Zhang, and N. C. MacDonald, Sensors and Actuators A, vol. 40, pp. 63–70, 1994.

    Article  Google Scholar 

  2. B. Diem, et al., Int. Conf. Solid-State Sensors and Actuators (Transducers’93), 1993, pp. 233–236.

    Google Scholar 

  3. H. Song, et al., MEMS’00, pp. 520–524.

    Google Scholar 

  4. S. Lee, Ph. D. Dissertation (in Korean), school of electrical engineering, Seoul National University, Feb 2000.

    Google Scholar 

  5. S. Lee, S. Park, J. Kim, S. Lee, and D. Cho, IEEE/ASME J. MEMS, pp. 557–567, 2000.

    Google Scholar 

  6. J.-L. A. Yeh, H. Jiang, and N. C. Tien, IEEE/ASMEJ. MEMS, pp. 456–465, 1999.

    Google Scholar 

  7. R. A. Conant, J. T. Nee, K. Y. Lau, and R. S. Muller, Solid-State Sensor and Actuator Workshop, 2000, pp. 6–9.

    Google Scholar 

  8. C. S.-B. Lee, S. Han, and N. C. MacDonald, Solid-State Sensor and Actuator Workshop, 1998, pp. 45–50.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2001 Springer-Verlag Berlin Heidelberg

About this paper

Cite this paper

Lee, S., Lee, BL., Jung, K.D., Choi, J.H., Chung, TR., Cho, Y.C. (2001). Extension of Surface/Bulk Micromachining: One-Mask Fabrication Technology Enabling the Integration of 6-DoF Inertial Sensors on a Single Wafer. In: Obermeier, E. (eds) Transducers ’01 Eurosensors XV. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-59497-7_262

Download citation

  • DOI: https://doi.org/10.1007/978-3-642-59497-7_262

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-42150-4

  • Online ISBN: 978-3-642-59497-7

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics

Navigation