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Streuung am Objekt und Bildkontrast

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Vierter Internationaler Kongress für Elektronenmikroskopie / Fourth International Conference on Electron Microscopy / Quatrième Congrès International de Microscopie Électronique

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Zusammenfassung

It has been recognized for more than 20 years (1) that one of the most important factors in the formation of electron microscope images is electron scattering. A number of papers have appeared (2) based on accepted theories of elastic and inelastic scattering. In order to obtain numerical results, approximations were made and in some cases the results were in fair agreement with experiments (3). We now believe that this agreement was only fair, due to the fact that the theoretical treatments were essentially based on statistical considerations where an average energy loss was used for the inelastic part of the scattering. During the last few years, quite an effort has been made, both experimental and theoretical, toward a better exploration of the inelastic process. As a result, we are now in a much better position to say something more definite about the factors contributing to the inelastic part of the electron scattering process and its role in image formation in electron microscopy.

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Authors and Affiliations

  1. National Bureau of Standards, Washington, D. C., USA

    L. Marton, L. B. Leder, C. Marton, H. Mendlowitz, J. A. Simpson, J. A. Suddeth & M. D. Wagner

  2. Max-Planck-Institut für Biophysik, Frankfurt/Main, Deutschland

    Werner Lippert

  3. Institut für angewandte Physik, Universität Hamburg, Deutschland

    M. Horstmann, G. Meyer & H. Raether

  4. Department of Metallurgy, Indian Institute of Science, Bangalore, India

    D. L. Bhattacharya

  5. Institut für Elektronenmikroskopie am Fritz-Haber-Institut der Max-Planck-Gesellschaft, Berlin-Dahlem, Deutschland

    H. Niehrs

  6. Research Laboratory, Associated Electrical Industries Ltd., Aldermaston Court, Aldermaston, Berkshire, England

    J. S. Halliday

  7. Cavendish Laboratory, University of Cambridge, England

    W. C. Nixon

  8. Technische Hochschule Aachen, Deutschland

    Friedrich Lenz

  9. Electrotechnical Laboratory, Tokyo, Japan

    Koichi Kanaya & Hisazo Kawakatsu

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  1. L. Marton
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  2. L. B. Leder
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  3. C. Marton
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  4. H. Mendlowitz
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  5. J. A. Simpson
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  6. J. A. Suddeth
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  7. M. D. Wagner
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  8. Werner Lippert
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  9. M. Horstmann
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  10. G. Meyer
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  11. H. Raether
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  12. D. L. Bhattacharya
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  13. H. Niehrs
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  14. J. S. Halliday
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  15. W. C. Nixon
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  16. Friedrich Lenz
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  17. Koichi Kanaya
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  18. Hisazo Kawakatsu
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W. Bargmann G. Möllenstedt H. Niehrs D. Peters E. Ruska C. Wolpers

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Marton, L. et al. (1960). Streuung am Objekt und Bildkontrast. In: Bargmann, W., Möllenstedt, G., Niehrs, H., Peters, D., Ruska, E., Wolpers, C. (eds) Vierter Internationaler Kongress für Elektronenmikroskopie / Fourth International Conference on Electron Microscopy / Quatrième Congrès International de Microscopie Électronique. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-49765-0_17

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