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Synchrotron Radiation for Measurement of Contaminants on Silicon Surfaces

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Abstract

The detection limit for aluminum using total reflection x-ray fluorescence (TXRF) is approximately 100 times lower for a synchrotron source compared to a conventional source. The detection limit for transition metals is approximately 15 to 40 times lower depending on atomic number and energy of the incident radiation.

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References

  1. P. Bertin, {unPrinciples and Practice of X-Ray Analysis}, 2nd ed. (Plenum Press, New York-London), p. 529–532.

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Authors and Affiliations

  1. Intel Corporation, P.O. Box 58119, Santa Clara, CA, 95052-8119, USA

    Michael C. Madden

  2. Fisons Instruments, 355 Shoreway Rd., San Carlos, CA, 94070, USA

    David C. Wherry

  3. Stanford Synchrotron Radiation Laboratory, P.O. Box 4349, Stanford, CA, 94309, USA

    Piero Pianetta & Sean Brennan

Authors
  1. Michael C. Madden
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  2. David C. Wherry
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  3. Piero Pianetta
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  4. Sean Brennan
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Madden, M.C., Wherry, D.C., Pianetta, P. et al. Synchrotron Radiation for Measurement of Contaminants on Silicon Surfaces. MRS Online Proceedings Library 307, 125–130 (1993). https://doi.org/10.1557/PROC-307-125

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  • DOI: https://doi.org/10.1557/PROC-307-125

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