Abstract
We present the results of experimental studies of the capacitance–voltage (C–V) characteristics and the spectra of deep-level transient spectroscopy (DLTS) of graded high-voltage p+–p0–i–n0 GaAs diodes fabricated by liquid-phase epitaxy at a crystallization-onset temperatures of 900°C from one solution melt due to self do** with background impurities, in a hydrogen or argon atmosphere, before and after irradiation with neutrons. After irradiation with neutrons, the DLTS spectra reveal wide defect-cluster regions with acceptor-like negatively charged traps of the n0-type layer, resulting from the emission of electrons from states located above the middle of the band gap. It is found that the differences in the C–V characteristics of the structures grown in a hydrogen or argon atmosphere are due to the different doses of irradiation of p+–p0–i–n0 GaAs structures and different degrees of compensation of shallow donor impurities by deep traps in the layers.
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1134%2FS1063782622010158/MediaObjects/11453_2022_3166_Fig1_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1134%2FS1063782622010158/MediaObjects/11453_2022_3166_Fig2_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1134%2FS1063782622010158/MediaObjects/11453_2022_3166_Fig3_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1134%2FS1063782622010158/MediaObjects/11453_2022_3166_Fig4_HTML.png)
Similar content being viewed by others
REFERENCES
M. M. Sobolev, F. Yu. Soldatenkov, and V. A. Kozlov, Semiconductors 50, 924 (2016).
M. M. Sobolev, P. R. Brunkov, S. G. Konnikov, M. N. Stepanova, V. G. Nikitin, V. P. Ulin, A. Sh. Dolbaya, T. D. Kamushadze, and R. M. Maisuradze, Sov. Phys. Semicond. 25, 637 (1989).
P. N. Brunkov, S. Gaibullaev, S. G. Konnikov, V. G. Nikitin, M. I. Papentsev, and M. M. Sobolev, Sov. Phys. Semicond. 25, 205 (1991).
G. M. Martin, A. Mitonneau, and A. Mircea, Electron. Lett. 13, 666 (1977). https://doi.org/10.1049/el:19770473
G. Guiloiot, Revue Phys. Appl. 23, 833 (1988). https://doi.org/10.1051/rphysap:01988002305083300
Sh. Makram-Ebeid and P. Boher, Rev. Phys. Appl. 23, 847 (1988).
C. E. Barnes, T. E. Zipperian, and L. R. Dawson, J. Electron. Mater. 14, 95 (1985). https://doi.org/10.1007/BF02656670
R. M. Fleming, D. V. Lang, C. H. Seager, E. Bielejec, G. A. Patrizi, and J. M. Campbell, J. Appl. Phys. 107, 123710-5 (2010). https://doi.org/10.1063/1.3448118
D. Pons and J. C. Bourgoin, J. Phys. C: Solid State Phys. 18, 3839 (1985).
V. N. Brudnyi and V. V. Peshev, Semiconductors 37, 140 (2003.
J. G. Williams, J. U. Patel, A. M. Ougouag, and S.-Y. Yang, J. Appl. Phys. 70, 4931 (1991). https://doi.org/10.1063/1.349039
F. Yu. Soldatenkov, V. G. Danil’chenko, and V. I. Ko-rol’kov, Semiconductors 41, 211 (2007).
V. G. Danil’chenko, V. I. Korol’kov, and F. Yu. Soldatenkov, Semiconductors 43, 1055 (2009).
V. A. Kozlov, F. Y. Soldatenkov, V. G. Danil’chenko, V. I. Korol’kov, and I. L. Shul’pina, in Proceedings of the 25th Advanced Semiconductor Manufacturing Conference, Saratoga Springs, USA, May 19–21, 2014, p. 139. https://doi.org/10.1109/ASMC.2014.6847011
L. S. Berman, V. G. Danil’chenko, V. I. Korol’kov, and F. Yu. Soldatenkov, Semiconductors 34, 541 (2000).
M. M. Sobolev, F. Y. Soldatenkov, and L. Shul’pina, J. Appl. Phys. 123, 161588 (2018). https://doi.org/10.1063/1.5011297
M. M. Sobolev and F. Yu. Soldatenkov, Semiconductors 52, 165 (2018).
M. M. Sobolev, O. S. Ken, O. M. Sreseli, D. A. Yavsin, and S. A. Gurevich, Tech. Phys. Lett. 44, 287 (2018).
M. M. Sobolev, O. S. Ken, O. M. Sreseli, D. A. Yavsin, and S. A. Gurevich, Semicond. Sci. Technol. 34, 085003 (2019). https://doi.org/10.1088/1361-6641/ab2c2123
M. M. Sobolev and F. Yu. Soldatenkov, Semiconductors 54, 1260 (2020).
M. M. Sobolev, F. Y. Soldatenkov, and V. G. Danil’chenko, J. Appl. Phys. 128, 095705 (2020). https://doi.org/10.1063/5.0018317
A. Sharma, P. Kumar, B. Singh, S. R. Chaudhuri, and S. Ghosh, Appl. Phys. Lett. 99, 023301 (2011). https://doi.org/10.1063/1.3607955
M. M. Sobolev, D. A. Yavsin, and S. A. Gurevich, Semiconductors 53, 1393 (2019).
H. Silva, H. L. Gomes, Yu. G. Pogorelov, P. Stallinga, D. M. de Leeuw, J. P. Araujo, J. B. Sousa, S. C. J. Mes-kers, G. Kakazei, S. Cardoso, and P. P. Freitas, Appl. Phys. Lett. 94, 202107 (2009). https://doi.org/10.1063/1.3134484
E. S. Yang, J. Appl. Phys. 45, 3801 (1974).
M. M. Sobolev, A. V. Gittsovich, M. I. Papentsev, I. V. Kochnev, and B. S. Yavich, Sov. Phys. Semicond. 26, 985 (1992).
D. V. Davydov, A. L. Zakgeim, F. M. Snegov, M. M. Sobolev, A. E. Chernyakov, A. S. Usikov, and N. M. Shmidt, Tech. Phys. Lett. 33, 143 (2007).
D. Stievenard, X. Boddaert, and J. C. Bourgoin, Phys. Rev. B 34, 4048 (1986). https://doi.org/10.1103/PhysRevB.34.4048
M. M. Sobolev, A. R. Kovsh, V. V. Ustinov, A. Y. Egorov, A. E. Zhukov, and Y. G. Musikhin, J. Electron. Mater. 28, 491 (1999).
Author information
Authors and Affiliations
Corresponding authors
Ethics declarations
We declare that we have no conflicts of interest.
Additional information
Translated by V. Selikhanovich
Rights and permissions
About this article
Cite this article
Sobolev, M.M., Soldatenkov, F.Y. Effect of Neutron Irradiation on the Spectrum of Deep-Level Defects in GaAs Grown by Liquid-Phase Epitaxy in a Hydrogen and Argon Atmosphere. Semiconductors 56, 107–114 (2022). https://doi.org/10.1134/S1063782622010158
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063782622010158