Abstract
n-Type 3C-SiC films have been grown by sublimation epitaxy on hexagonal silicon carbide substrates. The low-temperature conductivity and magnetoresistance of the films have been studied in relation to their do** level and structural perfection. It was found that a metal-insulator transition occurs in the n-3C-SiC layer at uncompensated donor concentrations N d − N a ≤ 3 × 1017 cm−3.
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Original Russian Text © A.A. Lebedev, P.L. Abramov, N.V. Agrinskaya, V.I. Kozub, A.N. Kuznetsov, S.P. Lebedev, G.A. Oganesyan, A.S. Tregubova, A.V. Chernyaev, D.V. Shamshur, M.O. Skvortsova, 2009, published in Fizika i Tekhnika Poluprovodnikov, 2009, Vol. 43, No. 3, pp. 337–341.
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Lebedev, A.A., Abramov, P.L., Agrinskaya, N.V. et al. Metal-insulator transition in n-3C-SiC epitaxial films. Semiconductors 43, 318–322 (2009). https://doi.org/10.1134/S1063782609030117
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DOI: https://doi.org/10.1134/S1063782609030117