A ‘dual-ligand passivation system’ is designed and synthesized to functionalize colloidal quantum dots to realize ultra-high resolution patterns by direct photolithography.
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Fan, J., Qian, L. Quantum dot patterning by direct photolithography. Nat. Nanotechnol. 17, 906–907 (2022). https://doi.org/10.1038/s41565-022-01187-0
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DOI: https://doi.org/10.1038/s41565-022-01187-0
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