References
R. Thielsch, W. Hassler and W. Bruckner, Phys. Stat. Sol. (a) 156 (1996) 199.
P. Verardi, M. Dinescu, F. Craciun and V. Sandu, Thin Solid Films 311 (1997) 171.
G. H. Haertling, J. Amer. Ceram. Soc. 82(4) (1999) 797.
J. W. Hutchinson and Z. Suo, Advances in Appl. Mech. 29 (1992) 63.
A. G. Evans and J. W. Hutchinson, Acta Metall. Mater. 43(7) (1995) 2507.
M. F. Gruninger, B. R. Lawn, E. N. Farabrugh and B. J. Wachtman, Jr., J. Amer. Ceram. Soc. 70(5) (1987) 344.
T. Y. Zhang, L. Q. Chen and R. Fu, Acta Mater. 47(14) (1999) 3869.
X. Fan, X Diffraction Mechanism (in Chinese), Mechanism Industry Publisher (1981).
C. M. Foster, Z. Li, M. Buckett, et al., J. Appl. Phys. 78(4) (1995) 2607.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Yang, Z.Y., Zhou, Y.C., Zheng, X.J. et al. Determination of residual stress in PZT thin film prepared by pulsed laser deposition. Journal of Materials Science Letters 21, 1541–1544 (2002). https://doi.org/10.1023/A:1020008817628
Issue Date:
DOI: https://doi.org/10.1023/A:1020008817628