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Size Effect on the Electromigration Characteristics of Flip Chip Pb-free Solder Bumps

  • Original Paper - Electronics, Magnetics and Photonics
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Abstract

To understand the size effect on electromigration (EM) behavior in flip chip Pb-free Sn-3.5Ag solder bumps, EM tests were performed with changes in the pad opening size and solder bump height at 140 °C and 4.6 × 104 A/cm2. Additionally, to exclude extrinsic factors such as Joule heating, EM behavior was observed using a multi Sn96.5Ag3.0Cu0.5 solder line sample at 150 °C and 6–7.5 × 104 A/cm2. The EM lifetime increased with decreasing pad opening size and bump height, and the EM critical current density (Jth) increased with decreasing line length. This result indicates that the EM resistance increases as the dimensions of the solder bump decreases, which can be understood by the EM jL product.

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References

  1. Chiu, S. H., Liang, S. W., Chen, C., Yao, D. J., Liu, Y. C., Chen, K. H., Lin, S. H.: Joule heating effect under accelerated electromigration in flip-chip solder joints. In: Proceedings of the 56th Electronic Components and Technology Conference, pp. 664–666. San Diego, CA (2006)

  2. Jeong, H., Lee, C.-J., Kim, J.-H., Son, J.-Y., Jung, S.-B.: Electromigration behavior of Cu core solder joints under high current density. Electron. Mater. Lett. 16, 513 (2020)

    Article  CAS  Google Scholar 

  3. Wei, C.C., Chen, C.F., Liu, P.C., Chen, C.: Electromigration in Sn–Cu intermetallic compounds. J. Appl. Phys. 105, 023715 (2009)

    Article  Google Scholar 

  4. Chu, Y.-C., Chen, C., Kao, N., Jiang, D.S.: Effect of Sn grain orientation and strain distribution in 20-µm-diameter microbumps on crack formation under thermal cycling tests. Electron. Mater. Lett. 13, 457 (2017)

    Article  CAS  Google Scholar 

  5. Shao, T.L., Liang, S.W., Lin, T.C., Chen, C.: Three-dimensional simulation on current-density distribution in flip-chip solder joints under electric current stressing. J. Appl. Phys. 98, 044509 (2005)

    Article  Google Scholar 

  6. Chen, C., Tong, H.M., Tu, K.N.: Electromigration and thermomigration in Pb-free flip-chip solder joints. Annu. Rev. Mater. Res. 40, 531 (2010)

    Article  CAS  Google Scholar 

  7. Yeh, E.C.C., Choi, W.J., Tu, K.N.: Current-crowding-induced electromigration failure in flip chip solder joints. Appl. Phys. Lett. 80, 580 (2002)

    Article  CAS  Google Scholar 

  8. Lloyd, J.R.: Electromigration in integrated circuit conductors. J. Phys. D: Appl. Phys. 32, 109 (1999)

    Article  Google Scholar 

  9. Huang, A.T., Tu, K.N., Lai, Y.-S.: Effect of the combination of electromigration and thermomigration on phase migration and partial melting in flip chip composite SnPb solder joints. J. Appl. Phys. 100, 033512 (2006)

    Article  Google Scholar 

  10. Lee, J. H., Lee, Y. D., Park, Y. B.: Joule Heating effect on the electromigration lifetimes and failure mechanisms of Sn-3.5Ag solder bump. In: Proceedings of the 57th Electronic Components and Technology Conference, pp.1436–144, Sparks, NV (2007)

  11. Yamanaka, K., Tsukada, Y., Suganuma, K.: Studies on solder bump electromigration in Cu/Sn–3Ag–0.5Cu/Cu system. Microelectron. Reliab. 47, 1280 (2007)

    Article  CAS  Google Scholar 

  12. Shao, T.L., Chen, Y.H., Chiu, S.H., Chen, C.: Electromigration failure mechanisms for SnAg3.5SnAg3.5 solder bumps on Ti∕Cr-Cu∕CuTi∕Cr-Cu∕Cu and Ni(P)∕AuNi(P)∕Au metallization pads. J. Appl. Phys. 96, 4518 (2004)

    Article  CAS  Google Scholar 

  13. Chiang, K.N., Lee, C.C., Lee, C.C., Chen, K.M.: Current crowding-induced electromigration in SnAg3.0Cu0.5SnAg3.0Cu0.5 microbumps. Appl. Phys. Lett. 88, 072102 (2006)

    Article  Google Scholar 

  14. Lee, T.Y., Tu, K.N.: Electromigration of eutectic SnPb and SnAg3.8Cu0.7SnAg3.8Cu0.7 flip chip solder bumps and under-bump metallization. J. Appl. Phys. 90, 4502 (2001)

    Article  CAS  Google Scholar 

  15. Liang, S.W., Chiu, S.H., Chen, C.: Effect of Al-trace degradation on Joule heating during electromigration in flip-chip solder joints. Appl. Phys. Lett. 90, 082103 (2007)

    Article  Google Scholar 

  16. Chiu, S.H., Shao, T.L., Chen, C.: Infrared microscopy of hot spots induced by Joule heating in flip-chip SnAg solder joints under accelerated electromigration. Appl. Phys. Lett. 88, 022110 (2006)

    Article  Google Scholar 

  17. Lin, K. L., Kuo, S. M.: The Electromigration and thermomigration behaviors of Pb-free flip chip Sn-3Ag-0.5Cu solder bumps. In: Proceedings of the 56th Electronic Components and Technology Conference, pp.667–672, San Diego, CA (2006)

  18. Brandenburg, S., Yeh, S.: Electromigration studies of flip chip bump solder joints. In: Proceeding of Surface Mount International Conference and Exposition, pp. 337–344, San Jose, CA (1998)

  19. Liu, C.Y., Chen, C., Liao, C.N., Tu, K.N.: Microstructure-electromigration correlation in a thin stripe of eutectic SnPb solder stressed between Cu electrodes. Appl. Phys. Lett. 75, 58 (1999)

    Article  CAS  Google Scholar 

  20. Liu, C.Y., Chen, C., Tu, K.N.: Electromigration in Sn–Pb solder strips as a function of alloy composition. J. Appl. Phys. 88, 5703 (2000)

    Article  CAS  Google Scholar 

  21. Huynh, Q.T., Liu, C.Y., Chen, C., Tu, K.N.: Electromigration in eutectic SnPb solder lines. J. Appl. Phys. 89, 4332 (2001)

    Article  CAS  Google Scholar 

  22. Sharma, A., Xu, D.E., Chow, J. Mayer, M.,  Sohn, H.-R., Jung, J.P.: Electromigration of composite Sn-Ag-Cu solder bumps. Electron. Mater. Lett. 11, 1072 (2015)

    Article  CAS  Google Scholar 

  23. Xu, D.E., Chow, J., Mayer, M. Jung, J.P., Yoon, J.H.: Sn-Ag-Cu to Cu joint current aging test and evolution of resistance and microstructure. Electron. Mater. Lett. 11, 1078 (2015)

    Article  CAS  Google Scholar 

  24. Eaton, D. H., Rowatt, J. D., Dauksher, W. H.: Geometry effects on the electromigration of eutectic sn/pb flip-chip solder bumps. In: Proceedings of IEEE 44th International Reliability Physics Symposium, pp.243–249, San Jose, CA (2006)

  25. Nah, J.W., Suh, J.O., Tu, K.N., Yoon, S.W., Rao, V.S., Kripesh, V., Hua, F.: Electromigration in flip chip solder joints having a thick Cu column bump and a shallow solder interconnect. J. Appl. Phys. 100, 123513 (2006)

    Article  Google Scholar 

  26. Huang, R., Ma, H., Shang, S., Kunwar, A., Wang, Y., Ma, H.: Size effect on interface reaction of Sn–xCu/Cu solder joints during multiple reflows. J. Mater. Sci.: Mater. Electron. 30, 4359 (2019)

  27. Park, G.-T., Lee, B.-R., Kim, J.-B., Son, K., Park, Y.B.: Solder volume effect on electromigration failure mechanism of Cu/Ni/Sn-Ag microbump. IEEE Trans. Comp. Packag. Manufac. Tech. 10, 1589 (2020)

    Article  CAS  Google Scholar 

  28. Ouyang, F.Y., Tu, K.N., Kao, C.-L., Lai, Y.-S.: Effect of electromigration in the anodic Al interconnect on melting of flip chip solder joints. Appl. Phys. Lett. 90, 211914 (2007)

    Article  Google Scholar 

  29. Ouyang, F. -Y., Huang, A. T., Tu, K. N.: Thermomigration in SnPb composite solder joints and wires. In: Proceedings of the 56th Electronic Components and Technology Conference, pp.1974–1978, San Diego, CA (2006)

  30. Huang, A.T., Gusak, A.M., Tu, K.N.: Thermomigration in SnPb composite flip chip solder joints. Appl. Phys. Lett. 88, 141911 (2006)

    Article  Google Scholar 

  31. Hsiao, H.Y., Chen, C.: Thermomigration in flip-chip SnPb solder joints under alternating current stressing. Appl. Phys. Lett. 90, 152105 (2007)

    Article  Google Scholar 

  32. Yang, D., Alam, M. O., Wu, B. Y., Chan, Y. C.: Thermomigration in eutectic tin-lead flip chip solder joints. In: Proceedings of the 8th Electronics Packaging Technology Conference, pp.565–569, Singapore (2006)

  33. Blech, I.A., Herring, C.: Stress generation by electromigration. Appl. Phys. Lett. 29, 131 (1976)

    Article  CAS  Google Scholar 

  34. Yoon, M.S., Lee, S.B., Kim, O.H., Park, Y.B., Joo, Y.C.: Relationship between edge drift and atomic migration during electromigration of eutectic SnPb lines. J. Appl. Phys. 100, 033715 (2006)

    Article  Google Scholar 

  35. Blech, I.A.: Electromigration in thin aluminum films on titanium nitride. J. Appl. Phys. Lett. 47, 1203 (1976)

    CAS  Google Scholar 

  36. Yeh, Y.T., Chou, C.K., Hsu, Y.C., Chen, C., Tu, K.N.: Threshold current density of electromigration in eutectic SnPb solder. Appl. Phys. Lett. 86, 203504 (2005)

    Article  Google Scholar 

  37. Hsu, Y.-C., Chou, C.-K., Liu, P.C., Chen, C., Yao, D.J., Chou, T., Tu, K.N.: Electromigration in Pb-free SnAg3.8Cu0.7 solder stripes. J. Appl. Phys. 98, 033523 (2005)

    Article  Google Scholar 

  38. Yu, H.C., Liu, S.H., Chen, C.: Study of electromigration in thin tin film using edge displacement method. J. Appl. Phys. 98, 013540 (2005)

    Article  Google Scholar 

Download references

Acknowledgements

This research was supported by Korea Institute for Advancement of Technology(KIAT) grant funded by the Korea Government(MOTIE)(P0008458, HRD Program for Industrial Innovation) and, the Technology Innovation Program (20016465, Development of dissimilar metal forming/joining technology for heat dissipation modules of energy first class efficiency electronic products and 20017189, Development of non cyanide gold bump solution and plating process for semiconductor device bonding process) funded By the Ministry of Trade. The authors would like to thank Mr. S. -T. Yang, Mr. Q. -H. Chung, K. -Y. Byun, and Dr. M. -S. Suh from SK Hynix Semiconductor Inc. and also Dr. M. -S. Yoon at Seoul National University for test sample preparations.

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Correspondence to Young-Bae Park.

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Kim, G., Son, K., Lee, JH. et al. Size Effect on the Electromigration Characteristics of Flip Chip Pb-free Solder Bumps. Electron. Mater. Lett. 18, 431–439 (2022). https://doi.org/10.1007/s13391-022-00356-6

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  • DOI: https://doi.org/10.1007/s13391-022-00356-6

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