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Influence of deposition parameters on the structure and optical property of Zn(S,O) films

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Abstract

This paper presents the influence of process parameters, including sputtering power, oxygen partial pressure (R O), and substrate temperature on the optical property of Zn(S,O) thin films fabricated by radio frequency magnetron sputtering technology and deposited on glass substrates. The chemical composition, structural and optical properties of the samples were investigated by electron spectroscopy for chemical analysis, X-ray diffraction, and spectrophotometer. All the films mainly exhibited β-ZnS phase with (111) preferred orientation. [S]/([S]+[O]) ratio increased at high sputtering power, low RO, and low substrate temperature. Moderate ranges in sputtering power and substrate temperature and low RO resulted in large grain size. Adatoms are expected to exhibit increased mobility under these conditions. Average transmittance exceeded 75% in the visible wavelength region. Bandgap under these conditions was dominated strongly by the change in grain size and [S]/([S]+[O]) ratio. Optical properties of Zn(S,O) thin films could be modified, which is promising for optoelectronic applications.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan, R.O.C.

    Du-Cheng Tsai, Bing-Hau Kuo, Erh-Chiang Chen & Fuh-Sheng Shieu

  2. Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung 411, Taiwan, R.O.C.

    Zue-Chin Chang

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  1. Du-Cheng Tsai
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  2. Bing-Hau Kuo
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Correspondence to Fuh-Sheng Shieu.

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Tsai, DC., Kuo, BH., Chang, ZC. et al. Influence of deposition parameters on the structure and optical property of Zn(S,O) films. Met. Mater. Int. 23, 163–169 (2017). https://doi.org/10.1007/s12540-017-6374-9

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