Log in

Oxygen incorporation in AllnP, and its effect on P-type do** with magnesium

  • Regular Issue Paper
  • Published:
Journal of Electronic Materials Aims and scope Submit manuscript

Abstract

Oxygen incorporation in AlyIn1−yP (y ∼ 0.5) grown by metalorganic chemical vapor deposition (MOCVD) has been studied as a function of PH3 flow, growth temperature, and alloy composition. Both O2 and diethylaluminum ethoxide (DEAlO) were employed as sources of oxygen. The incorporation of oxygen was found to be a superlinear function of O2 or DEAlO flow. When multiple sources of oxygen are present, a surface interaction leads to enhanced oxygen incorporation. Oxygen incorporation cannot be adequately described by a simple dependence on growth temperature or V/III ratio due to strong interactions between these variables. In Mg-doped AlInP co-doped with oxygen, the incorporation of both Mg and O is strongly affected by an interaction between the two species, and roughly 10% of the oxygen atoms act as compensating donors.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Subscribe and save

Springer+ Basic
EUR 32.99 /Month
  • Get 10 units per month
  • Download Article/Chapter or Ebook
  • 1 Unit = 1 Article or 1 Chapter
  • Cancel anytime
Subscribe now

Buy Now

Price includes VAT (Germany)

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. C.P. Kuo, R.M. Fletcher, T.D. Osentowski, M.C. Lardizabal, M.G. Craford, and V.M. Robbins, Appl. Phys. Lett. 57, 2937 (1990).

    Article  CAS  Google Scholar 

  2. H. Sugawara, K. Itaya, M. Ishikawa, and G. Hatakoshi, Jpn. J. Appl. Phys. 31, 2446 (1992).

    Article  CAS  Google Scholar 

  3. D.P. Bour and J.R. Shealy, Appl. Phys. Lett. 51, 1658 (1987).

    Article  CAS  Google Scholar 

  4. J.M. Olson, S.R. Kurtz, A.E. Kibbler, and P. Faine, Appl. Phys. Lett. 56, 623 (1990).

    Article  CAS  Google Scholar 

  5. H. Amano, M. Kito, K. Hiramatsu, N. Sawaki, and I. Akasaki, Jpn. J. Appl. Phys. 28, L2112 (1989).

    Google Scholar 

  6. S. Nakamura, T. Mukai, and M. Senoh, Appl. Phys. Lett. 64, 1687 (1994).

    Article  CAS  Google Scholar 

  7. R.M. Fletcher, C.P. Kuo, T.D. Osentowski, K.H. Huang, M.G. Craford and V.M. Robbins, J. Electron. Mater. 20, 1125 (1991).

    Article  CAS  Google Scholar 

  8. H. Sugawara, K. Itaya, H. Nozaki, and G. Hatakoshi, Appl. Phys. Lett. 61, 1775 (1992).

    Article  CAS  Google Scholar 

  9. F.A. Kish, F.M. Steranka, D.C. DeFevere, D.A. Vanderwater, K.G. Park, C.P. Kuo, T.D. Osentowski, M.J. Peanasky, J.G. Yu, R.M. Fletcher, D.A. Steigerwald, M.G. Craford, and V.M. Robbins, Appl. Phys. Lett. 64, 2839 (1994).

    Article  CAS  Google Scholar 

  10. H. Terao, and H. Sunakawa, J. Cryst. Growth 68, 157 (1984).

    Article  CAS  Google Scholar 

  11. Y. Mihashi, M. Miyashita, N. Kaneno, M. Tsugami, N. Fujii, S. Takamiya, and S. Mitsui, J. Cryst. Growth 141, 22 (1994).

    Article  CAS  Google Scholar 

  12. K. Domen, K. Sugiura, C. Anayama, M. Kondo, M. Sugawara, T. Tanahashi, and K. Nakajima, J. Cryst. Growth 115, 529 (1991).

    Article  CAS  Google Scholar 

  13. M. Kondo, N. Okada, K. Domen, K. Sugiura, C. Anayama, and T. Tanahashi, J. Electron. Mater. 23, 355 (1994).

    CAS  Google Scholar 

  14. Y. Nishikawa, M. Suzuki, and M. Okajima, Jpn. J. Appl. Phys. 32, 498 (1993).

    Article  CAS  Google Scholar 

  15. J. Schneider, B. Dischler, H. Seelewind, P.M. Mooney, J. Lagowski, M. Matsui, D.R. Beard, and R.C. Newman, Appl. Phys. Lett. 54, 1442 (1989).

    Article  CAS  Google Scholar 

  16. M. Skowronski, S.T. Neild, and R.E. Kremer, Appl. Phys. Lett. 57, 902 (1990).

    Article  CAS  Google Scholar 

  17. J.-W. Huang, D.F. Gaines, T.F. Kuech, R.M. Potemski, and F. Cardone, J. Electron. Mater. 23, 659 (1994).

    CAS  Google Scholar 

  18. See, for example, W.S. Hobson, “Hydrogen in Compound Semiconductors,” Materials Science Forum 148–149 S.J. Pearton, ed. (Aedermannsdorf, Switzerland: Trans Tech, 1994), p. 27.

  19. J.S. McCalmont, H.C. Casey, Jr., T.Y. Wang and G.B. Stringfellow, J. Appl. Phys. 71, 1046 (1991).

    Article  Google Scholar 

  20. In Aluminum Alkyls: Specifications, Properties, and Procedures (Texas Alkyls, Inc.), three vapor pressure data points for DEAlO were available: 5 mmHg at 93–94°C, 10 mmHg at 108–109°C, and 20 mmHg at 123–124°C. The temperature dependence of the DEAlO vapor pressure, p, was accordingly fitted as: Log p=8.8913–3006.6/(273.15 + T(°C)).

  21. J.S. Roberts, C.C. Button, and A. Chew, J. Cryst. Growth 135, 365 (1994).

    Article  CAS  Google Scholar 

  22. F.W. Reier, E. Jahn, N. Agrawal, P. Harde, and N. Grote, J. Cryst. Growth 135, 463 (1994).

    Article  CAS  Google Scholar 

  23. J.C. Chen, Z.C. Huang, K.J. Lee, and R. Kanjolia, J. Electron. Mater. 26, 361 (1997).

    CAS  Google Scholar 

  24. M. Suzuki, K. Itaya, Y. Nishikawa, H. Sugawara, and M. Okajima, J. Cryst. Growth 133, 303 (1993).

    Article  CAS  Google Scholar 

  25. M. Kondo, C. Anayama, N. Okada, H. Sekiguchi, K. Domen, and T. Tanahashi, J. Appl. Phys. 76, 914 (1994).

    Article  CAS  Google Scholar 

  26. T.F. Kuech, S. Nayak, J.-W. Huang, and J. Li, J. Cryst. Growth 163, 171 (1996).

    Article  CAS  Google Scholar 

  27. R. Mann and J.-W. Huang, unpublished work (1998).

  28. A. Gomyo, K. Kobayashi, S. Kawata, I. Hino, and T. Yuasa, Appl. Phys. Lett. 50, 673 (1987).

    Article  CAS  Google Scholar 

  29. T. Suzuki, A. Gomyo, I. Hino, K. Kobayashi, S. Kawata, and S. Iijima, Jpn. J. Appl. Phys. 27, L1549 (1988).

    Google Scholar 

  30. S. Minagawa, and M. Kondow, Electron. Lett. 25, 758 (1989).

    Article  Google Scholar 

  31. D.J. Friedman, G.S. Horner, S.R. Kurtz, K.A. Bertness, J.M. Olson, and J. Moreland, Appl. Phys. Lett. 65, 878 (1994).

    Article  CAS  Google Scholar 

  32. T.F. Kuech, R. Potemski, F. Cardone, and G. Scilla, J. Electron. Mater. 21, 341 (1992).

    CAS  Google Scholar 

  33. G.B. Stringfellow, J. Cryst. Growth 75, 91 (1986).

    Article  CAS  Google Scholar 

  34. C. Blaauw and L. Hobbs, Appl. Phys. Lett. 59, 674 (1991).

    Article  CAS  Google Scholar 

  35. C.M. Alavanja, C.J. Pinzone, S.K. Sputz, and M. Geva, Mater. Res. Soc. Symp Proc. 442 (Warrendale, PA: MRS, 1997), 441.

    Google Scholar 

  36. F. Bernardini, V. Fiorentini, and A. Bosin, Appl. Phys. Lett. 70, 2990 (1997).

    Article  CAS  Google Scholar 

  37. J.-W. Huang, J.M. Ryan, K.L. Bray, and T.F. Kuech, J. Electron. Mater. 24, 1539 (1995).

    CAS  Google Scholar 

  38. J.G. Cederberg, B. Bieg, J.-W. Huang, S.A. Stockman, M.J. Peanasky, and T.F. Kuech, Mat. Res. Soc. Symp. Proc. 484 (Warrendale, PA: MRS, 1998), p. 611.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Stockman, S.A., Huang, J.W., Osentowski, T.D. et al. Oxygen incorporation in AllnP, and its effect on P-type do** with magnesium. J. Electron. Mater. 28, 916–925 (1999). https://doi.org/10.1007/s11664-999-0220-x

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11664-999-0220-x

Key words

Navigation