Abstract
As an ideal dielectric substrate and protective packaging material for two-dimensional (2D) materials, high-quality hexagonal boron nitride (h-BN) films have attracted much attention. Previous studies have achieved high-quality h-BN on a Ni substrate due to its catalytic activity and B solubility. In this paper, a Ni-B alloy was utilized as a catalytic substrate and B source in the h-BN growth procedure. The growth of h-BN on a sapphire surface was achieved by a two-step growth–transfer method. The thickness of h-BN thin films is controlled by changing the growth time. Raman spectra show that the full width at half-maximum of E2g mode is 8.91 cm−1, which is much lower than most other chemical vapor deposition-grown h-BN. This provides a method for preparing high-quality h-BN and other layered 2D materials on an insulating substrate.
Graphic Abstract
![](http://media.springernature.com/lw685/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Figa_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Fig1_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Fig2_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Fig3_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Fig4_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Fig5_HTML.png)
![](http://media.springernature.com/m312/springer-static/image/art%3A10.1007%2Fs11664-023-10433-7/MediaObjects/11664_2023_10433_Fig6_HTML.png)
Similar content being viewed by others
Data Availability
All data that support the findings of this study are included within the article (and any supplementary files).
References
Z. Shi, X. Wang, Q. Li, P. Yang, G. Lu, R. Jiang, H. Wang, C. Zhang, C. Cong, Z. Liu, T. Wu, H. Wang, Q. Yu, and X. **e, Vapor-liquid-solid growth of large-area multi-layer hexagonal boron nitride on dielectric substrates. Nat. Commun. 11, 849 (2020).
T. Knobloch, Y. Illarionov, F. Ducry, C. Schleich, S. Wachter, K. Watanabe, T. Taniguchi, T. Mueller, M. Waltl, and M. Lanza, The performance limits of hexagonal boron nitride as an insulator for scaled CMOS devices based on two-dimensional materials. Nat. Electron. 4, 98 (2021).
L. Wang, I. Meric, P.Y. Huang, Q. Gao, Y. Gao, H. Tran, T. Taniguchi, K. Watanabe, L.M. Campos, D.A. Muller, J. Guo, P. Kim, J. Hone, K.L. Shepard, and C.R. Dean, One-dimensional electrical contact to a two-dimensional material. Science 342, 614 (2013).
D.K. Bediako, M. Rezaee, H. Yoo, D.T. Larson, S.F. Zhao, T. Taniguchi, K. Watanabe, T.L. Brower-Thomas, E. Kaxiras, and P. Kim, Heterointerface effects in the electrointercalation of van der Waals heterostructures. Nature 558, 425 (2018).
L. Li, F. Yang, G. Ye, Z. Zhang, Z. Zhu, W. Lou, X. Zhou, K. Watanabe, T. Taniguchi, K. Chang, Y. Wang, X. Chen, and Y. Zhang, Quantum Hall effect in black phosphorus two-dimensional electron system. Nat. Nanotechnol. 11, 593 (2016).
K. Zhang, Y. Feng, F. Wang, Z. Yang, and J. Wang, Two-dimensional hexagonal boron nitride (2D-h-BN): synthesis, properties and applications. J. Mater. Chem. C 5, 11992 (2017).
R.V. Gorbachev, I. Riaz, R. Nair, R. Jalil, L. Britnell, B.D. Belle, E.W. Hill, K.S. Novoselov, K. Watanabe, T. Taniguchi, A.K. Geim, and P. Blake, Hunting for monolayer boron nitride: optical and Raman signatures. Small 7, 465 (2011).
K. Watanabe, T. Taniguchi, and H. Kanda, Direct-bandgap properties and evidence for ultraviolet lasing of hexagonal boron nitride single crystal. Nat. Mater. 3, 404 (2004).
S.M. Kim, A.P. Hsu, H.C. Min, H.Y. Sang, S.J. Yun, J.S. Lee, D.F. Cho, W.L. Fang, M. Dresselhaus, K.K. Kim, Y.H. Lee, J. Kong, and T. Palacios, Synthesis of large-area multi-layer hexagonal boron nitride for high material performance. Nat. Commun. 6, 8662 (2015).
G. Lu, T. Wu, Q. Yuan, H. Wang, F. Ding, X. **e, and M. Jiang, Synthesis of large single-crystal hexagonal boron nitride grains on Cu-Ni alloy. Nat. Commun. 6, 6160 (2015).
S. Couldeva, R.S. Weatherup, C. Bayer, R. Blume, A. Cabrero, P. Weimer, M.B. Martin, R. Wang, C. Baehtz, R. Schloegl, J.C. Meyer, and S. Hofmann, Controlling catalyst bulk reservoir effects for monolayer hexagonal boron nitride CVD. Nano Lett. 16, 1250 (2016).
Y. Shi, C. Hamsen, X. Jia, K.K. Kim, A. Reina, M. Hofmann, A.L. Hsu, K. Zhang, H. Li, Z.Y. Juang, M.S. Dresselhaus, L. Li, and J. Kong, Synthesis of few-layer hexagonal boron nitride thin film by chemical vapor deposition. Nano Lett. 10, 4134 (2010).
L. Song, L. Ci, H. Lu, P.B. Sorokin, C. **, J. Ni, A.G. Kvashnin, D.G. Kvashnin, J. Lou, B.I. Yakobso, and P.M. Ajayan, Large-scale growth and characterization of atomic hexagonal boron nitride layers. Nano Lett. 10, 3209 (2010).
K.K. Kim, A. Hsu, X. Jia, S.M. Kim, Y. Shi, M. Hofmann, D. Nezich, J.F. Rodriguez, M. Dresselhaus, T. Palacios, and J. Kong, Synthesis of monolayer hexagonal boron nitride on Cu foil using chemical vapor deposition. Nano Lett. 12, 161 (2012).
J. Wang, X. Xu, T. Cheng, L. Gu, R. Qiao, Z. Liang, D. Ding, H. Hong, P. Zheng, Z. Zhang, and Z. Zhang, Dual-coupling-guided epitaxial growth of wafer-scale single-crystal WS2 monolayer on vicinal a-plane sapphire. Nat. Nanotechnol. 17, 33 (2022).
Y. Uchida, S. Nakandakari, K. Kawahara, S. Yamasaki, M. Mitsuhara, and H. Ago, Controlled growth of large-area uniform multi-layer hexagonal boron nitride as an effective 2D substrate. ACS Nano 12, 6236 (2018).
J.S. Lee, S. Choi, S.J. Yun, Y.I. Kim, S. Boandoh, J. Park, B.G. Shin, H. Ko, S.H. Lee, Y. Kim, Y.H. Lee, K.K. Kim, and S.M. Kim, Wafer-scale single-crystal hexagonal boron nitride film via self-collimated grain formation. Science 362, 817 (2018).
V. Babenko, G. Lane, A.A. Koós, A.T. Murdock, K. So, J. Britton, S.S. Meysami, J.G. Moffat, and N. Grobert, Time-dependent decomposition of ammonia borane for the controlled production of 2D hexagonal boron nitride. Sci. Rep. 7, 14297 (2017).
C. Wu, A.M. Soomro, F. Sun, H. Wang, Y. Huang, J. Wu, C. Liu, X. Yang, N. Gao, X. Chen, J. Kang, and D. Cai, Large-roll growth of 25-inch hexagonal BN monolayer film for self-release buffer layer of free-standing GaN wafer. Sci. Rep. 6, 34766 (2016).
A.M. Berhane, K.Y. Jeong, Z. Bodrog, S. Fiedler, T. Schröder, N.Y. Triviño, T. Palacios, A. Gali, M. Toth, D. Englund, and I. Aharonovich, Bright room-temperature single-photon emission from defects in gallium nitride. Adv. Mater. 29, 1605092 (2017).
T.C. Doan, J. Li, J.Y. Lin, and H.X. Jiang, Growth and device processing of hexagonal boron nitride epilayers for thermal neutron and deep ultraviolet detectors. AIP Adv. 6, 075213 (2016).
T.K. Paul, P. Bhattacharya, and D.N. Bose, Characterization of pulsed laser deposited boron nitride thin films on InP. Appl. Phys. Lett. 56, 2648 (1990).
H. Chou, S. Majumder, A. Roy, M. Catalano, P. Zhuang, L. Colombo, and S. Banerjee, Dependence of h-BN film thickness as grown on nickel single-crystal substrates of different orientations. ACS Appl. Mater. Interfaces 10, 44862 (2018).
S. Wang, X. Wang, and J. Warner, All chemical vapor deposition growth of MoS2:h-BN vertical van der waals heterostructures. ACS Nano 9, 5246 (2015).
H.X. Jiang, and J.Y. Lin, Hexagonal boron nitride for deep ultraviolet photonic devices. Semicond. Sci. Technol. 29, 084003 (2014).
A.R. Jang, S. Hong, C. Hyun, S.I. Yoon, G. Kim, H.Y. Jeong, T.J. Shin, S. Park, K. Wong, S. Kwak, and N. Park, Wafer-scale and wrinkle-free epitaxial growth of single orientated multi-layer hexagonal boron nitride on sapphire. Nano Lett. 16, 3360 (2016).
Q. Li, Q. Wu, J. Gao, T. Wei, J. Sun, H. Hong, Z. Dou, Z. Zhang, R. Mark, P. Gao, J. Yan, J. Wang, J. Li, Y. Zhang, Z. Liu, and Z. Liu, Direct growth of 5 in uniform hexagonal boron nitride on glass for high-performance deep-ultraviolet light-emitting diodes. Adv. Mater. Interfaces 5, 1800662 (2018).
R.Y. Tay, S.H. Tsang, M. Loeblein, W.L. Chow, G.C. Loh, J.W. Toh, S.T. Ang, and E.H. Teo, Direct growth of nanocrystalline hexagonal boron nitride films on dielectric substrates. Appl. Phys. Lett. 106, 101901 (2015).
L. Battezzati, C. Antonione, and M. Baricco, Undercooling of Ni-B and Fe-B alloys and their metastable phase diagrams. J. Alloys Compd. 247, 164 (1997).
L. Chien, C. Chiang, and C. Lao, Boron carbon oxynitride as a novel metal-free photocatalyst. Nanoscale Res. Lett. 16, 176 (2021).
S. Kim, A. Hsu, and M. Park, Synthesis of large-area multilayer hexagonal boron nitride for high material performance. Nat. Commun. 6, 8662 (2015).
Acknowledgments
The work has been financially supported by the National Natural Science Foundation of China (61774084), the special fund of Jiangsu province for the transformation of scientific and technological achievements (BA2022204), the Special Scientific Innovation Found of Sihong County (H201901), and the double carbon special fund of Jiangsu province (BE2022005). The Strategic Priority Research Program of the Chinese Academy of Sciences (XDB30000000), the Youth Innovation Promotion Association of the Chinese Academy of Sciences (2017281), the Science and Technology Commission of Shanghai Municipality (20501130200 and 2021-cyxt1-kj03), the National Natural Science Foundation of China (62174169).
Author information
Authors and Affiliations
Contributions
BL: Conceptualization, Formal analysis, Investigation, Methodology, Writing—original draft. HS: Funding acquisition, review & editing, Project administration. BL: Investigation. WM: Methodology. ZW: Validation. JZ: Validation. WM: Validation. YL: Methodology. TW: Funding acquisition, Supervision, review & editing.
Corresponding authors
Ethics declarations
Conflict of interest
The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
About this article
Cite this article
Chen, D., shen, H., Liu, B. et al. Controllable Synthesis of High-Quality Hexagonal Boron Nitride Films on Ni-B Alloy. J. Electron. Mater. 52, 4913–4920 (2023). https://doi.org/10.1007/s11664-023-10433-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-023-10433-7