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Do** Effect of Ca2+ Ions on the Electric and Magnetic Properties of Aurivillius CaxBi6–xFe0.5Co0.5Ti4O18 Thin Films Prepared by Chemical Solution Deposition

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Abstract

Do** with different valence ions in Aurivillius compounds can induce lattice distortion and further affect the ferroelectric and magnetic properties of the materials. In this work, CaxBi6–xFe0.5Co0.5Ti4O18 thin films were prepared to study the influence of the substitution of Ca2+ for Bi3+ on the microstructure and the dielectric, ferroelectric, leakage, and magnetic properties. The results show that the lattice distortion and the internal stress are both increased with increasing Ca2+ do** level. The dielectric and ferroelectric measurements suggest that the film with a low do** concentration (x = 0.2) exhibits better performance than the films with higher do** concentrations. Although lattice distortion and valence changes in the ions have been produced, which may have affected the distortion of the A/B-O octahedral crystal structure, tests of magnetic properties demonstrate that no regular changes are caused by the Ca2+ do**.

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All data included in this study are available upon request by contact with the corresponding author.

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Acknowledgments

Project supported by the National Natural Science Foundation of China (Grant Nos. 11804005 and 62004012), Key Scientific Research Projects for Colleges and Universities in Henan Province (Grant No. 21A140002), Training Program for University Key Teachers of Henan Province (Grant No. 2020GGJS235), Anhui Province Key R&D Program International Cooperation Project (Grant No. 202104b11020012), Research Fund of Anyang Institute of Technology (Grant No. YPY2020003).

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Authors and Affiliations

  1. Henan Joint International Research Laboratory of Nanocomposite Sensing Materials, School of Material Science and Engineering, Anyang Institute of Technology, Anyang, 455000, China

    Yuqiang Dai, Qianqian Gao, Chengbo Li & Chaojun Cui

  2. School of Material Science and Engineering, Anyang Institute of Technology, Anyang, 455000, China

    **aojie Hu

  3. Hefei Innovation Research Institute, Beihang University, Hefei, 230013, China

    Fengguang Liu

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  1. Yuqiang Dai
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Contributions

All authors contributed to study conception and design. Material preparation was performed by YD and XH. Data collection and analysis were performed by CL, CC and FL. The first draft of the manuscript was written by YD and QG. All authors commented on previous versions of the manuscript. Final manuscript read and approved by all authors.

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Correspondence to Qianqian Gao.

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Dai, Y., Gao, Q., Hu, X. et al. Do** Effect of Ca2+ Ions on the Electric and Magnetic Properties of Aurivillius CaxBi6–xFe0.5Co0.5Ti4O18 Thin Films Prepared by Chemical Solution Deposition. J. Electron. Mater. 52, 2505–2513 (2023). https://doi.org/10.1007/s11664-022-10206-8

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