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High electrochemical performance of nanostructured CoOOH grown on nickel foam by hydrothermal deposition for application in supercapacitor

  • Original Paper: Nano-structured materials (particles, fibers, colloids, composites, etc.)
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Abstract

In this work, nanostructured CoOOH grown on nickel foam as an electrode material for application in supercapacitor was prepared by a hydrothermal deposition strategy. The synthetic procedure includes formation of α-Co(OH)2 by epoxide precipitation, transformation of α-Co(OH)2 suspension to CoOOH colloidal solution and deposition of CoOOH particles on nickel foam by hydrothermal treatment. Due to the unique chemistry, the CoOOH particles deposited on nickel foam own extremely small size of about 3 nm. Induced by the small particle size and high conductivity of CoOOH, the as-prepared electrode material presents high electrochemical performance. It is demonstrated that the electrode material is capable of delivering high specific capacitance of 2165.1 F g−1 at scan rate of 5 mV s−1 with excellent cycle stability. It is surprising that this material presents high specific capacitance at very high current density (482.3 A g−1 at 63.9 A g−1).

Graphical Abstract

Nanostructured CoOOH was grown on nickel foam as an electrode material for application in supercapacitor through a hydrothermal deposition strategy. Due to the small particle-composed nanostructure and the high conductivity of CoOOH, the as-prepared electrode material presents high electrochemical performance.

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Authors and Affiliations

  1. Shandong Provincial Engineering Research Center for Light Hydrocarbon Comprehensive Utilization, College of Chemistry and Chemical Engineering, Yantai University, Yantai, 264005, China

    Hongtao Cui, Fangming Zhang, Wenle Ma, Li Wang & Junying Xue

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  1. Hongtao Cui
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  2. Fangming Zhang
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  3. Wenle Ma
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  4. Li Wang
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  5. Junying Xue
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Correspondence to Hongtao Cui.

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Cui, H., Zhang, F., Ma, W. et al. High electrochemical performance of nanostructured CoOOH grown on nickel foam by hydrothermal deposition for application in supercapacitor. J Sol-Gel Sci Technol 79, 83–88 (2016). https://doi.org/10.1007/s10971-016-4008-1

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  • DOI: https://doi.org/10.1007/s10971-016-4008-1

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