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Defects in nanostructures with ripened InAs/GaAs quantum dots

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Abstract

InAs/GaAs quantum dot (QD) structures were grown by molecular beam epitaxy (MBE) with InAs coverages θ continuously graded from 1.5 ML to 2.9 ML. A critical coverage of 2.23 ML is found, above which the islands undergo ripening, which causes a fraction of quantum dots to increase in size and to eventually relax through the formation of pure, edge-type misfit dislocations which propagate towards the surface in the form of V-shaped defects. Concomitant with ripening, extended-defect related traps with activation energies of 0.52 and 0.84 eV were observed, and regarded as the cause of the significant worsening of the optical and electrical properties in high coverage structures. Their relationship with the observed dislocations is discussed.

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Acknowledgements

The work was partially supported by the “SANDiE” Network of Excellence of EU, Contract No. NMP4-CT-2004-500101. The AFM characterization has been carried out at CIM, University of Parma.

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Authors and Affiliations

  1. CNR-IMEM Institute, Parco delle Scienze, 37A, Parma, 43100, Italy

    L. Nasi, C. Bocchi, F. Germini, M. Prezioso, E. Gombia, R. Mosca, P. Frigeri, G. Trevisi, L. Seravalli & S. Franchi

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  1. L. Nasi
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  2. C. Bocchi
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  3. F. Germini
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Correspondence to L. Nasi.

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Nasi, L., Bocchi, C., Germini, F. et al. Defects in nanostructures with ripened InAs/GaAs quantum dots. J Mater Sci: Mater Electron 19 (Suppl 1), 96–100 (2008). https://doi.org/10.1007/s10854-008-9657-6

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  • DOI: https://doi.org/10.1007/s10854-008-9657-6

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