Abstract
In the present work, a robust prediction model is presented for predicting Ni-W coating microhardness using powerful soft computing techniques, i.e., Gene expression programming (GEP). We considered the W content in coating (wt.%), pH, time (min) of coating bath, frequency (kHz) and current density (mA cm−2) of pulse current electrodeposition as input variables and the microhardness of Ni-W coatings as output variables. To achieve this, we had three main steps: (i) 63 experiments were collected to construct models; (ii) Creating training and testing phases based on 50 and 13 data and (iii) A new model is built and compared using correlation coefficients (R2), root relative square errors (RRSE), and relative standard errors (RSE). Using the results, GEP-6 was found to be the appropriate model for predicting the microhardness of Ni-W coatings with R2 = 0.9926, RSE = 0.0077, and RRSE = 0.0880. Additionally, sensitivity analysis results indicated that pulse electrodeposition's frequency, current density, and time of coating bath were the most effective parameters in determining microhardness.
Graphical abstract
Comparison of actual (experimented) versus predicted microhardness for Ni-W coatings using GEP-2, GEP-4, and GEP-6 models in (a) training, and (b) testing.
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Abbreviations
- GEP:
-
Gene expression programming
- RSE:
-
Relative standard error
- MEMS:
-
Microelectromechanical systems
- KMO:
-
Kaiser mayer olkin
- PVD:
-
Physical vapor deposition
- GA:
-
Genetic algorithm
- CVD:
-
Chemical vapor deposition
- GP:
-
Genetic programming
- R2 :
-
Correlation coefficient
- ET:
-
Expression tree
- RRSE:
-
Root relative square error
- SA:
-
Sensitivity analysis
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This research was performed by Mrs. Shojaei. Furthermore, Mrs. Shojaei was responsible for writing the manuscript. Also, Dr.Khayati acted as a supervisor in this research.
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Shojaei, Z., Khayati, G.R. Pulsed electrodeposition of Ni-W coatings predicts microhardness via gene expression programming. J Appl Electrochem 53, 1433–1447 (2023). https://doi.org/10.1007/s10800-023-01844-9
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DOI: https://doi.org/10.1007/s10800-023-01844-9