Abstract
The electrodeposition of Al-Ti alloy on a mild steel substrate is examined in a Lewis acidic 66.7–33.3 mol% AlCl3-1-buthyl-3-methylimidazolium chloride ionic liquid containing TiCl4. Dense and compact Al-Ti alloy coatings with Ti content ranging from 5.3 to 11.4 at.% can be obtained under optimized conditions. The applied current densities and TiCl4 concentration are found to play central roles in controlling the alloy compositions and surface morphologies of the resultant Al-Ti alloy coatings. Ti content in Al-Ti alloys increases with initial increase in the current density and decreases when the current density is beyond 5 mA cm−2. In addition, the enhanced corrosion resistance of the mild steel substrate by the deposited Al-Ti alloy layers is evaluated via electrochemical techniques. The Al-Ti alloy coatings show much higher corrosion resistance than single Al coating, and this performance is improved with the increase of the Ti content.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Frankel GS, Russak MA, Jahnes CV, Mirzamaani M, Brusic VA (1989) J Electrochem Soc 136:1243–1244
Yan Q, Yoshioka H, Habazaki H, Kawashima A, Asami K, Hashimoto K (1990) Corros Sci 31:401–406
Hampshirea J, Kelly PJ, Teer DG (2004) Thin Solid Films 30:418–424
Langrand L, Chausse A, Messina R (2001) Electrochim Acta 46:2407–2413
Janowski GM, Stafford GR (1992) Metall Trans A 23:2715–2723
Robin A, Ribeiro RB (2000) J Appl Electrochem 30:239–246
Stafford GR, Hussey CL (2002) Advances in electrochemical science and engineering. In: Alkire RC, Kolb DM (eds) . Wiley, Weinheim, pp 275–347
Buzzeo MC, Evans RG, Compton RG (2004) ChemPhysChem 5:1106–1120
Abedin S, El Z, Endres F (2006) ChemPhysChem 7:58–61
Tsuda T, Arimoto S, Kuwabata S, Hussey CL (2008) J Electrochem Soc 155:D256–D262
Pei QF, Hua YX, Xu CY, Zhang QB, Li Y, Ru JJ, Gong K (2013) Acta Phys -Chim Sin 29:946–952
Abedin S, El Z, Pölleth M, Meiss SA, Janek J, Endres F (2007) Green Chem 9:549–553
Armand M, Endres F, MacFarlane DR, Ohno H, Scrosati B (2009) Nat Mater 8:621–629
Carlin RT, Osteryoung RA, Wilkes JS, Rovng J (1990) Inorg Chem 29:3003–3009
Tsuda T, Hussey CL, Stafford GR, Bonevich JE (2003) J Electrochem Soc 150:C234–C243
Aravinda CL, Mukhopadhyay I, Freyland W (2004) Phys Chem Chem Phys 6:5225–5231
Pradhan D, Reddy RG (2009) Electrochim Acta 54:1874–1880
Pradhan D, Reddy RG, Lahiri AK (2009) Metall Mater Trans B 40:114–122
Ali MR, Nishikuta A, Tsuda T (2003) Indian Journal of Chemical Technology 10:14–20
Tsuda T, Kuwabata S, Stafford GR, Hussey CL (2013) J Solid State Electrochem 17:409–417
Lipsztajn M, Osteryoung RA (1985) Inorg Chem 24:706–715
Liu QX, Abedin S, El Z, Endres F (2006) Surface & Coatings Technology 201:1352–1356
Smialowska-Szklarska. Z (1999) Corros Sci 41:1743–1767
Pride ST, Scully JR, Hudson JL (1994) J Electrochem Soc 141:3028–3040
Habazaki H, Shimizu K, Skeldon P, Thompson GE, Wood GC, Zhou X (1997) Trans Inst Met Finish 75:18–23
Tomcsányi L, Varga K, Bartik I, Horányi H, Maleczki E (1989) Electrochim Acta 34:855–859
Acknowledgements
The authors gratefully appreciate for the support of the Natural Science Foundation of China (Project No. 21263007, 51274108) for this work.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Xu, C., Hua, Y., Zhang, Q. et al. Electrodeposition of Al-Ti alloy on mild steel from AlCl3-BMIC ionic liquid. J Solid State Electrochem 21, 1349–1356 (2017). https://doi.org/10.1007/s10008-016-3498-7
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10008-016-3498-7