Abstract
Well adhered C3N4 films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) on industrial pure iron substrates using ternary Si−N−C films as buffer layer. XRD measurement showed that the C3N4 films belong to the α-C3N4 phase. Electrochemical experiments showed that the corrosive resistance of the pure iron raised by two orders of magnitude after being covered with the α-C3N4 coating.
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Foundation item: Supported by the National Natural Science Foundation of China(19875037)
Biography: ZHANG Wei(1975-), male, Graduate student. Research direction: thin film.
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Wei, Z., Zhi-hong, Z., Huai-xi, G. et al. Corrosion resistance properties and preparation of α-C3N4 thin films. Wuhan Univ. J. Nat. Sci. 4, 171–174 (1999). https://doi.org/10.1007/BF02841492
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DOI: https://doi.org/10.1007/BF02841492