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35 Years of challenge and innovation in ion implant

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Abstract

Over the last 35 years the implant industry has faced several technical challenges. Usually, but not always, these are brought on by semiconductor scaling causing a change of dimensions, materials, or topologies. So far, each time that has caused a problem for the existing technology, there has been an innovation that has saved the day. Some innovations, like the plasma flood gun now seem relatively minor. Others, like single wafer implantation were more significant. We will review several of these critical innovations.

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The datasets generated during and/or analyzed during the current study are available from the corresponding author on reasonable request.

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Acknowledgments

I would like to thank the kind folk who helped me with the material for this presentation. They were Joe Olson, Michael Current, Ben Colombeau, Chris Campbell, Tim Miller, Chris Hatem, Aseem Srivastava, Craig Chaney, Jay Scheuer, Steve Krause, Jonathan England, Reuel Liebert and Frank Sinclair. This would not have been possible without their generous support.

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  1. Varian Semiconductor (Retired), Gloucester, MA, USA

    Anthony Renau

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  1. Anthony Renau
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Correspondence to Anthony Renau.

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Renau, A. 35 Years of challenge and innovation in ion implant. MRS Advances 7, 1234–1240 (2022). https://doi.org/10.1557/s43580-022-00366-4

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