Abstract
The morphological and structural properties of a series of high-pressure high-temperature (HPHT) single-crystal diamond substrates are comprehensively studied by white-light optical interference microscopy, atomic-force microscopy, and X-ray diffraction analysis. Procedures that provide a means for characterizing the substrate parameters most critical for epitaxial application with the laboratory equipment are described. It is shown that the jewelry-type characterization of diamond substrates is insufficient to assess the possibility of their use for the epitaxial growth of chemical-vapor-deposited (CVD) diamond.
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ACKNOWLEDGMENTS
The part of the study concerned with the preparation of substrates for epitaxy was supported by the Russian Science Foundation, project no. 17-19-01580.
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Translated by E. Smorgonskaya
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Yunin, P.A., Volkov, P.V., Drozdov, Y.N. et al. Study of the Structural and Morphological Properties of HPHT Diamond Substrates. Semiconductors 52, 1432–1436 (2018). https://doi.org/10.1134/S1063782618110271
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DOI: https://doi.org/10.1134/S1063782618110271