Abstract
Three deep acceptor levels with activation energies of ~0.7, ~0.41, and ~0.16 eV are found in GaAs structures, which have the hole type of conductivity and are grown by liquid-phase epitaxy, by the methods of capacitance spectroscopy (admittance spectroscopy and deep-level transient spectroscopy). The first two levels are known as HL2 and HL5 and are related to the features of GaAs-layer growth by liquid-phase epitaxy. They are effective recombination centers determining reverse currents in p–i–n diodes, which is confirmed by studying the temperature dependences of reverse currents. The level with the energy Ev + 0.16 eV can be related to the two-charge acceptor level of the inherent antisite defect in GaAs, which also determines the do** concentration of structures in the singly charged state.
Similar content being viewed by others
References
V. Voitovich, A. Dumanevich, and A. Gordeev, Sovrem. Elektron., No. 6, 10 (2014).
S. Bellone, G. Cocorullo, F. G. della Corte, H. L. Hartnageland, and G. Schweeger, Solid State Electron. 35, 821 (1992).
M. M. Sobolev, P. R. Brunkov, S. G. Konnikov, M. N. Stepanova, V. G. Nikitin, V. P. Ulin, A. Sh. Dolbaya, T. D. Kamushadze, and R. Maisuradze, Sov. Phys. Semicond. 25, 637 (1991).
P. N. Brunkov, S. Gaibullaev, S. G. Konnikov, V. G. Nikitin, M. I. Papentsev, and M. M. Sobolev, Sov. Phys. Semicond. 25, 205 (1991).
L. S. Berman, V. G. Danil’chenko, V. I. Korol’kov, and F. Yu. Soldatenkov, Semiconductors 34, 541 (2000).
O. Korolkov, J. Toompuu, and T. Rang, Elektron. Elektrotekh. 19, 1392 (2013).
Ya. Toompuu, O. Korol’kov, N. Slepchuk, and T. Rang, Elektron. Elektrotekh., No. 4, 51 (2010).
V. L. Kryukov, E. V. Kryukov, L. A. Meerovich, S. S. Strel’chenko, and K. A. Titivkin, RF Patent No. 2488911 C1, Application No. 2012110151/28 (2012).
D. L. Losee, J. Appl. Phys. 46, 2204 (1975).
J. L. Pautrat, B. Katirciogli, N. Magnea, D. Bensahel, J. C. Pfistert, and L. Revioil, Solid State Electron. 23, 1159 (1980).
D. V. Lang, J. Appl. Phys. 45, 3023 (1974).
L. S. Berman and A. A. Lebedev, Capacitive Spectroscopy of Deep-Level Centers in Semiconductors (Nauka, Leningrad, 1981) [in Russian].
G. Roos, A. Schoner, G. Pencl, K. Krambrock, and B. K. Meyer, Mater. Sci. Forum 38–41, 951 (1989).
Phil Won Yu, W. C. Mitchel, M. G. Mier, S. S. Li, and W. L. Wang, Appl. Phys. Lett. 41, 532 (1982).
S. R. Forrest and O. K. Kim, J. Appl. Phys. 53, 5738 (1982).
A. Dargis and J. Kundrotas, Handbook on Physical Properties of Ge, Si, GaAs and InP (Sci. Encyclopedia, Vilnus, 1994).
A. Czerwinski, E. Simoen, A. Poyai, and C. Claeys, J. Appl. Phys. 94, 1218 (2003).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © A.V. Murel, V.B. Shmagin, V.L. Krukov, S.S. Strelchenko, E.A. Surovegina, V.I. Shashkin, 2017, published in Fizika i Tekhnika Poluprovodnikov, 2017, Vol. 51, No. 11, pp. 1538–1542.
Rights and permissions
About this article
Cite this article
Murel, A.V., Shmagin, V.B., Krukov, V.L. et al. Capacitance spectroscopy of hole traps in high-resistance gallium-arsenide structures grown by liquid-phase epitaxy. Semiconductors 51, 1485–1489 (2017). https://doi.org/10.1134/S1063782617110197
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063782617110197