Abstract
Herein, we have investigated the optical and microwave dielectric properties of Bi0.5Na0.5TiO3 (BNT) thin films grown under different oxygen pressure (PO2) using the pulsed laser deposition technique. The X-ray diffraction measurements confirm the single phase of BNT and the secondary phase and a further reduction in the secondary phase and increase in the BNT phase with PO2, which signifies the close relationship between the crystal structure and oxygen content. The shift of Raman-active TO1, TO2, and TO3 modes towards higher wavelengths and increase in mode intensity with PO2 indicating the degree of the film of crystallinity. The local roughness (αloc) of all films obtained as ∼ 0.85 and the interface width (ω) and lateral correlation length (ξ) of films vary with PO2. Also, the films exhibit an increase in refractive index and reduction in the optical bandgap due to improvement in crystallinity and reduction in the oxygen vacancies. The microwave dielectric properties show that a strong PO2 depends on the higher dielectric constant (εr = 336) with lower loss (tanδ = 0.0093) at 5 GHz, which shows the potential applications in high-frequency devices.
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Y. Sun, H. Wang, G. Liu, H. **e, C. Zhou, G. Chen, C. Yuan, J. Xu, J. Mater. Sci. Mater. Electron. 31, 5546 (2020)
S. Takagi, A. Subedi, V.R. Cooper, D.J. Singh, Phys. Rev. B—Condens. Matter Mater. Phys. 82, 19 (2010)
J.F. Scott, Science 315, 954 (2007)
N.D. Co, L.V. Cuong, B.D. Tu, P.D. Thang, L.X. Dien, V.N. Hung, N.D. Quan, J. Sci. Adv. Mater. Devices 4(3), 370–375 (2019)
M.S. Tsai, S.C. Sun, T.Y. Tseng, J. Appl. Phys. 82, 3482 (1997)
Z. Kutnjak, R. Blinc, Y. Ishibashi, Phys. Rev. B—Condens. Matter Mater. Phys. 76, 104102 (2007)
Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya, M. Nakamura, Nature 432, 84 (2004)
F. Li, D. Lin, Z. Chen, Z. Cheng, J. Wang, C. Li, Z. Xu, Q. Huang, X. Liao, L.Q. Chen, T.R. Shrout, S. Zhang, Nat. Mater. 17, 349 (2018)
Q. Wang, C.R. Bowen, W. Lei, H. Zhang, B. **e, S. Qiu, M.Y. Li, S. Jiang, J. Mater. Chem. A 6, 5040 (2018)
G. Gui Peng, D. Yi Zheng, C. Cheng, J. Zhang, H. Zhang, J. Alloys Compd. 693, 1250 (2017)
A.M. Mazuera, P.S. Silva, A.D. Rodrigues, P.S. Pizani, Y. Romaguera-Barcelay, M. Venet, M. Algueró, Phys. Rev. B 94, 1 (2016)
B. Dai, P. Zheng, W. Bai, F. Wen, L. Li, W. Wu, Z. Ying, L. Zheng, J. Eur. Ceram. Soc. 38, 4212 (2018)
H. Bao, C. Zhou, D. Xue, J. Gao, X. Ren, J. Phys. D. Appl. Phys. 43, 465401 (2010)
D. Shreiber, W. Zhou, G. Dang, M. Taysing-Lara, G. Metcalfe, E. Ngo, M. Ivill, S.G. Hirsch, M.W. Cole, Thin Solid Films 660, 282 (2018)
X.X. Wang, X.G. Tang, H.L.W. Chan, Appl. Phys. Lett. 85, 91 (2004)
S. Pattipaka, A.R. James, P. Dobbidi, J. Electron. Mater. 47, 3876 (2018)
M. Peddigari, P. Dobbidi, AIP Adv. 5, 107129 (2015)
G.A. Smolenskii, V.A. Isupov, A.I. Agranovskaya, N.N. Krainik, Fiz. Tverd. Tela Sanktpeterbg. 2, 2982 (1960)
H.S. Mohanty, A. Kumar, B. Sahoo, P.K. Kurliya, D.K. Pradhan, J. Mater. Sci. Mater. Electron. 29, 6966 (2018)
M. Matsuura, H. Iida, K. Hirota, K. Ohwada, Y. Noguchi, M. Miyayama, Phys. Rev. B—Condens. Matter Mater. Phys. 87, 22 (2013)
S. Pattipaka, A.R. James, P. Dobbidi, J. Alloys Compd. 765, 1195 (2018)
C. Peng, J.F. Li, W. Gong, Mater. Lett. 59, 1576 (2005)
M. Li, M.J. Pietrowski, R.A. De Souza, H. Zhang, I.M. Reaney, S.N. Cook, J.A. Kilner, D.C. Sinclair, Nat. Mater. 13, 31 (2014)
Y. Yao, Y. Li, N. Sun, J. Du, X. Li, L. Zhang, Q. Zhang, X. Hao, J. Alloys Compd. 750, 228 (2018)
J. Cui, Y. Zhang, J. Wang, Z. Zhao, H. Huang, W. Zou, M. Yang, R. Peng, W. Yan, Q. Huang, Z. Fu, Y. Lu, Phys. Rev. B 100, 165312 (2019)
M.N.R. Ashfold, F. Claeyssens, G.M. Fuge, S.J. Henley, Chem. Soc. Rev. 33, 23 (2004)
H. Fujioka, in Handb. Cryst. Growth Thin Film. Ep. Second Ed. (2014), pp. 365–397
S. Zorba, L. Yan, N.J. Watkins, Y. Gao, Appl. Phys. Lett. 81, 5195 (2002)
B.C. Mohanty, H.R. Choi, Y.S. Cho, J. Appl. Phys. 106, 054908 (2009)
S. Yim, T.S. Jones, Phys. Rev. B—Condens. Matter Mater. Phys. 73, 161305 (2006)
S. Das Sarma, P.P. Chatraphorn, Z. Toroczkai, Phys. Rev. B—Condens. Matter Mater. Phys. 64, 2054071 (2001)
R. Kesarwani, P.P. Dey, A. Khare, RSC Adv. 9, 7967 (2019)
G. Pradhan, P.P. Dey, A.K. Sharma, RSC Adv. 9, 12895 (2019)
N. Rotenberg, A.D. Bristow, M. Pfeiffer, M. Betz, H.M. Van Driel, Phys. Rev. B—Condens. Matter Mater. Phys. 75, 1 (2007)
G. Gowri, R. Saravanan, S. Sasikumar, M. Nandhakumar, R. Ragasudha, J. Mater. Sci. Mater. Electron. 30, 4409 (2019)
K. Shan, Z.-Z. Yi, X.-T. Yin, D. Dastan, H. Garmestani, Dalt. Trans. 49, 8549 (2020)
K. Shan, Z.-Z. Yi, X.-T. Yin, D. Dastan, F. Altaf, H. Garmestani, F.M. Alamgir, Surf. Interfaces 21, 100762 (2020)
K. Shan, F. Zhai, Z.-Z. Yi, X.-T. Yin, D. Dastan, F. Tajabadi, A. Jafari, S. Abbasi, Surf. Interfaces 23, 100905 (2021)
T. Zhao, Z.H. Chen, F. Chen, H. Bin Lu, G.Z. Yang, H.S. Cheng, Appl. Phys. Lett. 77, 4338 (2000)
D. Dastan, Appl. Phys. A Mater. Sci. Process. 123, 699 (2017)
G.L. Tan, D. Tang, D. Dastan, A. Jafari, J.P.B. Silva, X.T. Yin, Mater. Sci. Semicond. Process. 122, 105506 (2021)
G.L. Tan, D. Tang, D. Dastan, A. Jafari, Z. Shi, Q.Q. Chu, J.P.B. Silva, X.T. Yin, Ceram. Int. 47, 17153 (2021)
Z.G. Zhang, F. Zhou, X.Q. Wei, M. Liu, G. Sun, C.S. Chen, C.S. Xue, H.Z. Zhuang, B.Y. Man, Phys. E Low-Dimens. Syst. Nanostruct. 39, 253 (2007)
Y.L. Wang, X.K. Chen, M.C. Li, R. Wang, G. Wu, J.P. Yang, W.H. Han, S.Z. Cao, L.C. Zhao, Surf. Coatings Technol. 201, 5344 (2007)
D. Yang, L. Xue, Thin Solid Films 494, 28 (2006)
F. Yang, P. Wu, D.C. Sinclair, J. Mater. Chem. C 5, 7243 (2017)
M. Pelliccione, T.M. Lu, Evolution of Thin Film Morphology (Springer, Berlinemclose, 2008)
K. Chopra, J. Klerrer, Thin Film Phenomena (McGraw-Hill, New York; London, 1970)
D. Dastan, J. At. Mol. Condens. Nano Phys. 2, 109 (2015)
R. Swanepoel, J. Phys. E 16, 1214 (1983)
S. Ponmudi, R. Sivakumar, C. Sanjeeviraja, C. Gopalakrishnan, J. Mater. Sci. Mater. Electron. 30, 18315 (2019)
A.T.T. Mostako, A. Khare, Laser Part. Beams 30, 559 (2012)
M. Bousquet, J.R. Duclère, E. Orhan, A. Boulle, C. Bachelet, C. Champeaux (2010) J. Appl. Phys. 107,104107
J. Tauc, Opt. Prop. Solids 277 (1972)
A. Joseph, J.P. Goud, S.R. Emani, K.C.J. Raju, AIP Conf. Proc. 1731, 80039 (2016)
W. Zhang, X. Zhu, L. Liang, P. Yin, P. **e, D. Dastan, K. Sun, R. Fan, Z. Shi, J. Mater. Sci. 56, 4254 (2021)
L. Sun, L. Liang, Z. Shi, H. Wang, P. **e, D. Dastan, K. Sun, R. Fan, Eng. Sci. 12, 95 (2020)
Y. Zhao, X. Hao, M. Li, J. Alloys Compd. 601, 112 (2014)
J. Krupka, J. Eur. Ceram. Soc. 23, 2607 (2003)
A. Rambabu, S. Bashaiah, K.C. James Raju, J. Mater. Sci. Mater. Electron. 25, 1172 (2014)
J. Krupka, A.P. Gregory, O.C. Rochard, R.N. Clarke, B. Riddle, J. Baker-Jarvis, J. Eur. Ceram. Soc. 21, 2673 (2001)
Acknowledgements
The authors acknowledge the facilities supported by DAE BRNS [37(1)/14/33/2015/BRNS] and [DST/CRG/19/0650], India. The authors are grateful to the Centre for Nanotechnology and Central Instruments Facility (CIF) and Indian Institute of Technology Guwahati, India, for providing experimental facilities.
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Pattipaka, S., Dobbidi, P., Pundareekam Goud, J. et al. Investigation of surface scaling, optical and microwave dielectric studies of Bi0.5Na0.5TiO3 thin films. J Mater Sci: Mater Electron 33, 8893–8905 (2022). https://doi.org/10.1007/s10854-021-06970-8
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DOI: https://doi.org/10.1007/s10854-021-06970-8