We are improving our search experience. To check which content you have full access to, or for advanced search, go back to the old search.

Search

Please fill in this field.
Filters applied:

Search Results

Showing 1-20 of 787 results
  1. Role of Oxygen in PECVD Carbon Nanotubes Growth: Experiments and Modeling

    We investigate by modeling supported by experiments the role of oxygen in carbon nanotubes (CNT) growth by plasma enhanced chemical vapor deposition...

    A. Andalouci, I. Hinkov, ... S. Farhat in Plasma Chemistry and Plasma Processing
    Article 21 February 2023
  2. Fabrication of Paper-Based Microfluidic Devices Using PECVD for Selective Separation

    The interest in microfluidic devices is increasing day by day due to consuming much lower amount of chemicals. Paper-based microfluid device is one...

    Mehmet Gürsoy in Macromolecular Research
    Article 30 June 2021
  3. Preparing Thin Gallium Sulphide Films via PECVD and Studying Their Properties

    Abstract

    Thin films of GaS х are obtained via plasma-enhanced chemical vapor deposition (PECVD) for the first time, while high-purity volatile...

    L. A. Mochalov, M. A. Kudryashov, ... A. V. Knyazev in Russian Journal of Physical Chemistry A
    Article 01 January 2023
  4. PECVD Preparation of Nitrogen Plasma Do** SiO2@TiO2 Composites with a Core-Shell Structure for Lithium-Ion Battery Anode

    Abstract

    Nitrogen plasma-doped SiO 2 @TiO 2 composites were prepared by plasma-enhanced chemical vapor deposition (PECVD). SiO 2 @TiO 2 with a core-shell...

    Yuchen Huang, Lijie Cao, Pan**g Zeng in Russian Journal of Physical Chemistry A
    Article 01 December 2023
  5. The Effect of the Process Parameters on the Growth Rate and Composition of the Anti Scratch Films Deposited from TEOS by AP-PECVD on Polycarbonate

    In this paper we report on a study of the composition and growth rate of anti scratch silica-like coatings deposited on polycarbonate (PC) in an...

    Anastasia S. Bil, Sergey E. Alexandrov in Plasma Chemistry and Plasma Processing
    Article 18 April 2023
  6. The Effect of the Process Parameters on the Composition and Properties of Silica-Like Films Deposited by Atmospheric Pressure PECVD in the System TEOS-He-O2

    In this paper we report on a study of an atmospheric pressure plasma enhanced chemical vapor deposition process based on a simple dielectric barrier...

    Anastasia S. Bil, Sergey E. Alexandrov in Plasma Chemistry and Plasma Processing
    Article 23 September 2022
  7. Investigation of Vacuum Annealing Temperature Effects on the Microstructure Properties of DC-PECVD Grown Diamond Nanoparticles

    In this study, nanodiamonds (NDs) coatings were grown on gold-coated silicon substrates by a DC-plasma enhanced chemical vapor (DC-PECVD) deposition...

    Somayeh Asgary, Elnaz Vaghri, Amir Hoshang Ramezani in Journal of Inorganic and Organometallic Polymers and Materials
    Article 01 January 2021
  8. Environmentally Friendly Approach for the Plasma Surface Modification of Fabrics for Improved Fog Harvesting Performance

    Fog harvesting from the air is one of the sustainable and effective methods to obtain fresh water. Energy-free fog collector systems are widely used...

    Mehmet Gürsoy, Berkan Kocadayıoğulları in Fibers and Polymers
    Article 28 August 2023
  9. Effect of Power on Crystallinity and Opto-Electronic Properties of Silicon Thin Films Grown Using VHF PECVD Process

    The silicon thin films have been deposited using VHF (60 MHz) plasma enhanced chemical vapor deposition (PECVD) process. The influence of the power...

    Sucheta Juneja, Sushil Kumar in Silicon
    Article 14 September 2020
  10. The Effects of Porous Silicon and Silicon Nitride Treatments on the Electronic Qualities of Multicrystalline Silicon for Solar Cell Applications

    This work used plasma-enhanced chemical vapor deposition (PECVD) at low temperatures to deposit a silicon nitride layer on multicrystalline silicon...

    Nashmi H. Alrasheedi in Silicon
    Article 05 December 2023
  11. Control of CeO2 Defect Sites for Photo- and Thermal- Synergistic Catalysis of CO2 and Methanol to DMC

    Quadrangular-pyramid-octahedral CeO 2 with defects was successfully prepared and first used as effective and reusable heterogeneous catalyst for...

    Jia-qi Bai, Lingling Lv, ... Song Sun in Catalysis Letters
    Article 27 December 2022
  12. Crystallization of Hydrogenated Amorphous Silicon Thin Films Using Combined Continuous Wave Laser and Thermal Annealing

    The thermal process of amorphous silicon thin film crystallization when combined with an aluminum (Al) film using a continuous wave (CW) laser is...

    Adnan Shariah in Silicon
    Article 11 May 2024
  13. Experimental Methods

    Magnetomicrofluidic chip fabrication methods are explained. These techniques are the microfabrication techniques widely used in semiconductor...
    Chapter 2023
  14. Plasma-Enhanced Chemical Vapor Deposition of Thin GaS Films on Various Types of Substrates

    Abstract

    Gallium monosulfide (GaS), a representative of Group III monochalcogenide layered materials, is a wide-bandgap semiconductor. It is...

    M. A. Kudryashov, L. A. Mochalov, ... E. A. Slapovskaya in High Energy Chemistry
    Article 30 November 2023
  15. Equilibrium calculations for plasmas of volatile halides of III, IV and VI group elements mixed with H2 and H2 + CX4 (X = H, Cl, F) relevant to PECVD of isotopic materials

    The composition of hydrogen and hydrogen-methane plasmas containing ~ 10% of BX 3 , SiX 4 , GeX 4 (X = F, Cl), SF 6 , MoF 6 and WF 6 is calculated for the...

    I. B. Gornushkin, P. G. Sennikov, ... V. S. Polyakov in Journal of Radioanalytical and Nuclear Chemistry
    Article 30 July 2020
  16. Electrochemical sensing platform based on screen-printed carbon electrode modified with plasma polymerized acrylonitrile nanofilms for determination of bupropion

    A original electrochemical sensing platform, based on screen-printed electrodes modification with plasma polymerized acrylonitrile (pp-AN)...

    Maria Madej, Agata Trzcińska, ... Jacek Tyczkowski in Microchimica Acta
    Article Open access 14 September 2023
  17. Parametric Study of Plasma Characteristics and Carbon Nanofibers Growth in PECVD System: Numerical Modeling

    The aim of the present work is to develop a numerical model to understand and optimize the process parameters for the growth of carbon nanofibers...

    Ravi Gupta, Suresh C. Sharma in Plasma Chemistry and Plasma Processing
    Article 30 May 2020
  18. Mathematical Evaluation of a-Si:H Film Formation in rf-PECVD Systems

    Radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) is an efficient technique for preparing hydrogenated amorphous silicon (a-Si:H)...

    Jabbar Ganji, Abdolnabi Kosarian, Hooman Kaabi in Silicon
    Article 16 May 2019
  19. Study of Optical Properties of Single and Double Layered Amorphous Silicon Nitride Films for Photovoltaics Applications

    This work focuses on the optical properties of single- and double-layer amorphous silicon nitride (a-SiN x :H) thin films of different stoichiometry...

    Pariksha Malik, Harsh Gupta, ... Pankaj Srivastava in Silicon
    Article 14 July 2022
Did you find what you were looking for? Share feedback.