Page
%P
![Loading...](https://link.springer.com/static/c4a417b97a76cc2980e3c25e2271af3129e08bbe/images/pdf-preview/spacer.gif)
-
Article
Influence of process parameters on band gap of Al-doped ZnO film
This paper presents the influence of process parameters, such as argon (Ar) flow rate, sputtering power and substrate temperature on the band gap of Al-doped ZnO film, Al-doped ZnO thin films were fabricated b...
-
Article
Influence of substrate temperature on in situ-textured ZnO thin films grown by MOCVD
The influence of substrate temperature on microstructure, electrical and optical properties of in situtextured zinc oxide (ZnO) films fabricated by metal organic chemical vapor deposition (MOVCD) had been inve...