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Nanoparticle Formation in Zn+ and O+ Ion Sequentially Implanted SiO2 Film
The 64Zn+ and 16O+ ions were implanted in SiO2 film on Si substrate with next parameters: the implant dose was 5.0 × 1016 cm–2, for Zn+ ions the energy was 50 keV and for O+ ions the energy was 16 keV. Than the s...