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Article
Low Temperature Synthesis of Polycrystalline Diamond by Microwave Plasma-Enhanced Chemical Vapor Deposition
Polycrystalline diamond thin films have been deposited on single crystal silicon substrates at low temperatures (<950°C) using a mixture of methane and hydrogen gases by high pressure microwave plasma assisted...
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Article
Selective Growth of Poly-Diamond Thin Films Using Selective Damaging by Ultrasonic Agitation on a Variety of Substrates
Polycrystalline diamond thin films have been selectively deposited on Si, SiO2, Si3 N4, Ta, Mo, alumina, and sapphire substrates using selective damaging by ultrasonic agitation. Novel processes were developed to...
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Article
Selective Growth of Polycrystalline Diamond Thin Films
Microwave plasma assisted CVD is employed to grow diamond films using a gas mixture of H2 and CH4on various substrates. Diamond has a tendency not to nucleate growth on mirror-smooth finished substrates irrespect...
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Article
Selective Nucleation of Diamond Crystals on the Apex of Silicon Pyramids
Diamond crystals have been selectively grown on the apex of anisotropically chemically etched silicon pyramids. A novel process sequence is developed which exposes patterned sharp apex of silicon pyramids surr...
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Article
Effect of Oxygen on the Textured Diamond Growth over Nickel Substrates
Microwave plasma has been used to grow diamond films using CH4 and H2 over nickel substrates. Nucleation of the diamond has been achieved by manual scratching and ultrasonic agitation of the substrates. The subst...
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Article
Adhesion and Young’s Modulus of CVD Diamond Thin Films Grown Over Various Substrates
Diamond films were deposited by microwave plasma CVD using H2 and CH4 gas mixture over various substrate materials such as Si, Pd, Be, Cu, Mo, AIN, SiO2, Si3N4, Al2O3, Sapphire, Quartz, Ni-base alloys, single cry...
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Article
Diamond Growth on (a) Large Mo Cylinders at 30 Torr and (b) Flat Mo at One Atmospheric Pressure of H2 and CH4
(a) Polycrystalline diamond films have been grown on cylindrical Mo substrates by hot filament and microwave plasma CVD techniques using a gas mixture of hydrogen and methane. A single hot tungsten filament has b...
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Article
Plasma Etching and Patterning of CVD Diamond at <100° for Microelectronics Application
Oxidation resistance of diamond is an important characteristic to be considered in many high temperature microelectronics and other applications. We have tested the stability of CVD diamong by exposing to Grou...
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Article
AC and DC Polarization and Cyclic Voltammetric Behavior of Boron-Doped CVD Diamond in 0.5M NaCl Solution
Boron-doped diamond has been deposited over a Mo substrate by microwave plasma CVD using methane and hydrogen. Boron do** of diamond has been achieved in situ by using a solid boron source while growing the ...