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Article
Preparation of CaMgSi and Ca7Mg7.25Si14 single phase films and their thermoelectric properties
Ca-Mg-Si films were firstly prepared on (001)Al2O3 substrates by RF-magnetron sputtering method from Mg disc target together with Ca and Si chips. The composition of the deposited films was controlled by adjustin...
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Article
Control of p- and n-type Conduction in Thermoelectric Non-doped Mg2Si Thin Films Prepared by Sputtering Method
A method for controlling the conduction-type in Mg2Si films without do** is investigated. Mg2Si films exhibit p-type conduction after a post-heat treatment up to 500 °C in atmospheric He. However, covering the ...
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Article
High Temperature Reproducible Preparation of Mg2Si Films on (001)Al2O3 substrates Using RF Magnetron Sputtering Method
A RF magnetron sputtering method was used to prepare Mg2Si films at 300-400oC on (001) Al2O3 substrates from a Mg disc target with Si chips. Mg deposition was not detected at 400°C from a pure Mg disc target with...
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Article
Small-strain (100)/(001)-oriented epitaxial PbTiO3 films with film thickness ranging from nano- to micrometer order grown on (100)CaF2 substrates by metal organic chemical vapor deposition
Changes in crystal structure and ferroelectric properties are investigated for (100)/(001)-oriented epitaxial PbTiO3 thin films grown on CaF2 substrates by metal organic chemical vapor deposition. In this work, P...