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    Chapter and Conference Paper

    Phase Partition Based Virtual Metrology for Material Removal Rate Prediction in Chemical Mechanical Planarization Process

    In semiconductor manufacturing, the average Material Removal Rate (MRR) in Chemical Mechanical Planarization (CMP) process is important but difficult to measure. A useful method to predict MRR is to build a da...

    Wenlan Jiang, Chunpu Lv, Tao Zhang, Huangang Wang in Artificial Intelligence (2021)