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Article
Growth and interfacial properties of atomic layer deposited Al0.7Ti0.3O y high-k dielectric on Ge substrate
Growth and interfacial properties of atomic layer deposited Al0.7Ti0.3O y on Ge have been investigated as a potential high-k gate dielectric for future Ge-based metal oxide semi...
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Article
Effect of ozone treatment on the optical and electrical properties of HfSiO thin films
The effect of room temperature ozone oxidation treatment on thin HfSiO film grown by atomic layer deposition (ALD) has been investigated. The optical and electrical properties with different post-ozone oxidati...
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Chapter
Laser-Assisted Scanning Probe Alloying Nanolithography (LASPAN)
Nanoscale science and technology demands novel approaches and new knowledge for further development. Nanofabrication has been widely employed in modern science and engineering. Probe-based nanolithography is a...