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    Chapter and Conference Paper

    Performance of over 100 W HVM LPP-EUV Light Source

    light source is widely accepted to be the most promising solution for the 13.5 nm high power light source for high volume manufacturing (HVM) EUV lithography. We have been develo** LPP systems using CO2 lase...

    S. Okazaki, H. Nakarai, T. Abe, K. M. Nowak, Y. Kawasuji, H. Tanaka… in X-Ray Lasers 2016 (2018)